Adhesion and Mechanical Properties of a-CSi:H Thin Films Prepared from Tetravinylsilane Monomer by Plasma Polymerization

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F18%3APU129094" target="_blank" >RIV/00216305:26310/18:PU129094 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Adhesion and Mechanical Properties of a-CSi:H Thin Films Prepared from Tetravinylsilane Monomer by Plasma Polymerization

Popis výsledku v původním jazyce

The adhesion of the thin film to the substrate and mechanical properties of this film are some of the most important and crucial attribute in determining the thin film's application possibilities. Thin films with controlled adhesion are essential as barrier, anti-scratch, wear-resistant, transparent and antireflective coatings for surface modified materials. The greatest potential of this research for industrial applications is in glass-fiber-reinforced polymer composites without sharp interfaces. In this study, hydrogenated amorphous silicon-carbon (a-CSi:H) thin films were studied from the point of adhesion to the silicon substrate. Silicon wafers were pretreated with argon plasma (5.7 Pa, 10 sccm, 5 W, 10 min) using continuous wave to reach reproducible thin film adhesion. Thin films were deposited by plasma-enhanced chemical vapor deposition (PECVD) from pure tetravinylsilane (TVS) monomer (2.7 Pa, 3.8 sccm), employing a radiofrequency (RF) helical coupling system, using a pulsed regime with effec

Název v anglickém jazyce

Adhesion and Mechanical Properties of a-CSi:H Thin Films Prepared from Tetravinylsilane Monomer by Plasma Polymerization

Popis výsledku anglicky

The adhesion of the thin film to the substrate and mechanical properties of this film are some of the most important and crucial attribute in determining the thin film's application possibilities. Thin films with controlled adhesion are essential as barrier, anti-scratch, wear-resistant, transparent and antireflective coatings for surface modified materials. The greatest potential of this research for industrial applications is in glass-fiber-reinforced polymer composites without sharp interfaces. In this study, hydrogenated amorphous silicon-carbon (a-CSi:H) thin films were studied from the point of adhesion to the silicon substrate. Silicon wafers were pretreated with argon plasma (5.7 Pa, 10 sccm, 5 W, 10 min) using continuous wave to reach reproducible thin film adhesion. Thin films were deposited by plasma-enhanced chemical vapor deposition (PECVD) from pure tetravinylsilane (TVS) monomer (2.7 Pa, 3.8 sccm), employing a radiofrequency (RF) helical coupling system, using a pulsed regime with effec

Druh

O - Ostatní výsledky

CEP obor

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OECD FORD obor

10403 - Physical chemistry

Projekt

<a href="/cs/project/GA16-09161S" target="_blank" >GA16-09161S: Syntéza multifunkčních plazmových polymerů pro polymerní kompozity bez rozhraní</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2018

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů