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Synthesis and characterization of half-Heusler ScPtBi films via three-source magnetron co-sputtering on Nb superconductor buffer layer

Identifikátory výsledku

  • Kód výsledku v IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26620%2F23%3APU149032" target="_blank" >RIV/00216305:26620/23:PU149032 - isvavai.cz</a>

  • Výsledek na webu

    <a href="https://www.sciencedirect.com/science/article/pii/S2468023023004881?via%3Dihub" target="_blank" >https://www.sciencedirect.com/science/article/pii/S2468023023004881?via%3Dihub</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.surfin.2023.103118" target="_blank" >10.1016/j.surfin.2023.103118</a>

Alternativní jazyky

  • Jazyk výsledku

    angličtina

  • Název v původním jazyce

    Synthesis and characterization of half-Heusler ScPtBi films via three-source magnetron co-sputtering on Nb superconductor buffer layer

  • Popis výsledku v původním jazyce

    The half-Heusler compounds exhibit simultaneous electrical, optical, and magnetic properties hence extensive research efforts have recently been dedicated to their development in diverse applications. Herein, we detail the fabrication and magnetic characterization of thin film ScPtBi was grown at 300 degrees C on Nb-buffered Si (100) single crystals (Nb/Si (100)) by using magnetron co-sputtering. X-ray diffraction examinations have unveiled the polycrystalline growth nature of the films. It is seen that the obtained ScPtBi thin film is strained by 1.4% compared to the single crystal of ScPtBi. The morphological observations, conducted by scanning electron mi-croscopy (SEM), revealed that the Nb buffer layer has a smooth and crack-free surface. Moreover, it has been observed that the Bi islands are formed on the surface of ScPtBi film, which is confirmed by the high-resolution scanning transmission electron microscopy (HR-STEM) analyses. The presence of the weak antilocalization (WAL) effect has been observed in the samples. The Hikami-Larkin-Nagaoka (HLN) equation was used to analyze experimental data, aiming to calculate the phase coherence length (l & phi;) and the coefficient & alpha;. As the temperature increased, the phase coherence length decreased from 39 nm to 24 nm. The coefficient & alpha; was determined to be in the range of 500 to 1100. As a result, it has been concluded that the presence of the WAL effect might be connected to the strong spin-orbit coupling (SOC) nature of the films instead of from topologically protected surface states.

  • Název v anglickém jazyce

    Synthesis and characterization of half-Heusler ScPtBi films via three-source magnetron co-sputtering on Nb superconductor buffer layer

  • Popis výsledku anglicky

    The half-Heusler compounds exhibit simultaneous electrical, optical, and magnetic properties hence extensive research efforts have recently been dedicated to their development in diverse applications. Herein, we detail the fabrication and magnetic characterization of thin film ScPtBi was grown at 300 degrees C on Nb-buffered Si (100) single crystals (Nb/Si (100)) by using magnetron co-sputtering. X-ray diffraction examinations have unveiled the polycrystalline growth nature of the films. It is seen that the obtained ScPtBi thin film is strained by 1.4% compared to the single crystal of ScPtBi. The morphological observations, conducted by scanning electron mi-croscopy (SEM), revealed that the Nb buffer layer has a smooth and crack-free surface. Moreover, it has been observed that the Bi islands are formed on the surface of ScPtBi film, which is confirmed by the high-resolution scanning transmission electron microscopy (HR-STEM) analyses. The presence of the weak antilocalization (WAL) effect has been observed in the samples. The Hikami-Larkin-Nagaoka (HLN) equation was used to analyze experimental data, aiming to calculate the phase coherence length (l & phi;) and the coefficient & alpha;. As the temperature increased, the phase coherence length decreased from 39 nm to 24 nm. The coefficient & alpha; was determined to be in the range of 500 to 1100. As a result, it has been concluded that the presence of the WAL effect might be connected to the strong spin-orbit coupling (SOC) nature of the films instead of from topologically protected surface states.

Klasifikace

  • Druh

    J<sub>imp</sub> - Článek v periodiku v databázi Web of Science

  • CEP obor

  • OECD FORD obor

    10400 - Chemical sciences

Návaznosti výsledku

  • Projekt

  • Návaznosti

    O - Projekt operacniho programu

Ostatní

  • Rok uplatnění

    2023

  • Kód důvěrnosti údajů

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Údaje specifické pro druh výsledku

  • Název periodika

    SURFACES AND INTERFACES

  • ISSN

    2468-0230

  • e-ISSN

  • Svazek periodika

    40

  • Číslo periodika v rámci svazku

    103118

  • Stát vydavatele periodika

    NL - Nizozemsko

  • Počet stran výsledku

    7

  • Strana od-do

    „“-„“

  • Kód UT WoS článku

    001039896600001

  • EID výsledku v databázi Scopus

    2-s2.0-85165257810