Komplexní studium vrstev připravených metodami PECVD a PACVD analytickými metodami RBS, ERDA a AFM.

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F44555601%3A13430%2F04%3A00002694" target="_blank" >RIV/44555601:13430/04:00002694 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

The combined study of the organosilicon films by RBS, ERDA and AFM analytical methods obtained from PECVD and PACVD

Popis výsledku v původním jazyce

Organosilicon plasma deposited polymers are of interest for different kinds of applications like packaging, passivation and dielectric layers. A large set of plasma processes is possible, among which are low-pressure plasma enhanced chemical vapour deposition (PECVD) and plasma assisted chemical vapour deposition (PACVD) often used. In this work, we studied the composition and surface morphology of the hexamethyldisiloxane (HMDSO) and tetramethyldisoloxane (TMDSO) layers produced by PECVD and PACVD deposition using three plasma generation processes (plasma reactors): RF inductively coupled plasma (RFICP), microwave distributed electron cyclotron resonance plasma (DECR) and microwave induced remote nitrogen afterlow (MIRA). The layers composition was investigated by Rutherford backscattering spectrometry (RBS) and by elastic recoil detection analysis (ERDA) and the layer surface morphology was determined by atomic force microscopy (AFM). Composition, density and morphology (roughness, p

Název v anglickém jazyce

The combined study of the organosilicon films by RBS, ERDA and AFM analytical methods obtained from PECVD and PACVD

Popis výsledku anglicky

Organosilicon plasma deposited polymers are of interest for different kinds of applications like packaging, passivation and dielectric layers. A large set of plasma processes is possible, among which are low-pressure plasma enhanced chemical vapour deposition (PECVD) and plasma assisted chemical vapour deposition (PACVD) often used. In this work, we studied the composition and surface morphology of the hexamethyldisiloxane (HMDSO) and tetramethyldisoloxane (TMDSO) layers produced by PECVD and PACVD deposition using three plasma generation processes (plasma reactors): RF inductively coupled plasma (RFICP), microwave distributed electron cyclotron resonance plasma (DECR) and microwave induced remote nitrogen afterlow (MIRA). The layers composition was investigated by Rutherford backscattering spectrometry (RBS) and by elastic recoil detection analysis (ERDA) and the layer surface morphology was determined by atomic force microscopy (AFM). Composition, density and morphology (roughness, p

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/OC%20527.50" target="_blank" >OC 527.50: Studium tenkých polymerních vrstev pomocí AFM a rozvoj metod diagnostiky plazmatu.</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2004

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface Science

ISSN

0039-6028

e-ISSN

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Svazek periodika

566-568

Číslo periodika v rámci svazku

2

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

4

Strana od-do

1143-1146

Kód UT WoS článku

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EID výsledku v databázi Scopus

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