Interfacial layer formation during high-temperature deposition of Sm-Co magnetic thin films on Si (100) substrates
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F46747885%3A24620%2F19%3A00005752" target="_blank" >RIV/46747885:24620/19:00005752 - isvavai.cz</a>
Výsledek na webu
<a href="https://www.sciencedirect.com/science/article/pii/S0966979518308161" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0966979518308161</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.intermet.2018.12.007" target="_blank" >10.1016/j.intermet.2018.12.007</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Interfacial layer formation during high-temperature deposition of Sm-Co magnetic thin films on Si (100) substrates
Popis výsledku v původním jazyce
The interfacial layer that has formed during the deposition of ∼240-nm thick Sm-Co films on the bare Si (100) substrate was investigated at different deposition temperatures, Td,Sm-Co: 400, 450 and 500 °C with respect to structural and magnetic properties of Sm-Co films. X-ray diffraction analysis showed the crystallization of both Sm2Co17(R) and SmCo5(H) magnetic phases. Rutherford back scattering studies demonstrated that the surface-diffusion reactions between the Sm-Co layer and Si-surface not only accompanied by the quasi-layered growth of CoSi2-phase; but also led to the formation of SmCoSi2-phase. Cross-sectional transmission electron microscopy analysis revealed uneven boundary with deeply grown CoSi2-layer and Moiré fringes at limited regions of Co/Si interface. Magnetic measurements showed a square hysteresis loop with maximum values of coercivity (11.6 kOe) and remanence ratio (0.99) for the films grown at 500 °C. Magnetic force microscopy images depicted patch-like domains with increasing phase contrast against Td,Sm-Co. In addition, the changes that has occurred in the magnetization reversal processes accompanied by coercivity enhancement due to higher Td,Sm-Co is discussed in the context of domain morphology and first-order reversal curves.
Název v anglickém jazyce
Interfacial layer formation during high-temperature deposition of Sm-Co magnetic thin films on Si (100) substrates
Popis výsledku anglicky
The interfacial layer that has formed during the deposition of ∼240-nm thick Sm-Co films on the bare Si (100) substrate was investigated at different deposition temperatures, Td,Sm-Co: 400, 450 and 500 °C with respect to structural and magnetic properties of Sm-Co films. X-ray diffraction analysis showed the crystallization of both Sm2Co17(R) and SmCo5(H) magnetic phases. Rutherford back scattering studies demonstrated that the surface-diffusion reactions between the Sm-Co layer and Si-surface not only accompanied by the quasi-layered growth of CoSi2-phase; but also led to the formation of SmCoSi2-phase. Cross-sectional transmission electron microscopy analysis revealed uneven boundary with deeply grown CoSi2-layer and Moiré fringes at limited regions of Co/Si interface. Magnetic measurements showed a square hysteresis loop with maximum values of coercivity (11.6 kOe) and remanence ratio (0.99) for the films grown at 500 °C. Magnetic force microscopy images depicted patch-like domains with increasing phase contrast against Td,Sm-Co. In addition, the changes that has occurred in the magnetization reversal processes accompanied by coercivity enhancement due to higher Td,Sm-Co is discussed in the context of domain morphology and first-order reversal curves.
Klasifikace
Druh
J<sub>imp</sub> - Článek v periodiku v databázi Web of Science
CEP obor
—
OECD FORD obor
20501 - Materials engineering
Návaznosti výsledku
Projekt
Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.
Návaznosti
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Ostatní
Rok uplatnění
2019
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
Intermetallics
ISSN
0966-9795
e-ISSN
—
Svazek periodika
106
Číslo periodika v rámci svazku
March
Stát vydavatele periodika
NL - Nizozemsko
Počet stran výsledku
12
Strana od-do
36-47
Kód UT WoS článku
000457815700006
EID výsledku v databázi Scopus
—