Pathway for a low-temperature deposition of alpha-Al2O3: A molecular-dynamics study

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F13%3A43919458" target="_blank" >RIV/49777513:23520/13:43919458 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.surfcoat.2013.07.062" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2013.07.062</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2013.07.062" target="_blank" >10.1016/j.surfcoat.2013.07.062</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Pathway for a low-temperature deposition of alpha-Al2O3: A molecular-dynamics study

Popis výsledku v původním jazyce

Thin films of alpha-Al2O3 are of high interest because of their mechanical properties. Previously, the preparation of Al2O3 has been described in terms of extrinsic process parameters, such as total pressure, oxygen partial pressure or substrate bias potential. In this paper the growth of Al2O3 is studied by atom-by-atom molecular dynamics simulations, focused on intrinsic process parameters such as ion energy, ion fraction in the particle flux, growth temperature and growth template. While the preparation of alpha-Al2O3 by currently available techniques requires temperatures of around 1000 °C (well above the typical softening temperature of tool steel substrates), the paper presents a narrow window of intrinsic process parameters which leads to an uninterrupted epitaxial growth or growth of previously nucleated alpha-Al2O3 at low temperatures.

Název v anglickém jazyce

Pathway for a low-temperature deposition of alpha-Al2O3: A molecular-dynamics study

Popis výsledku anglicky

Thin films of alpha-Al2O3 are of high interest because of their mechanical properties. Previously, the preparation of Al2O3 has been described in terms of extrinsic process parameters, such as total pressure, oxygen partial pressure or substrate bias potential. In this paper the growth of Al2O3 is studied by atom-by-atom molecular dynamics simulations, focused on intrinsic process parameters such as ion energy, ion fraction in the particle flux, growth temperature and growth template. While the preparation of alpha-Al2O3 by currently available techniques requires temperatures of around 1000 °C (well above the typical softening temperature of tool steel substrates), the paper presents a narrow window of intrinsic process parameters which leads to an uninterrupted epitaxial growth or growth of previously nucleated alpha-Al2O3 at low temperatures.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2013

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface & Coatings Technology

ISSN

0257-8972

e-ISSN

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Svazek periodika

2013

Číslo periodika v rámci svazku

235

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

9

Strana od-do

333-341

Kód UT WoS článku

000329596100043

EID výsledku v databázi Scopus

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