Mechanical characterization of a-C:H:SiOx coatings synthesized using radio-frequency plasma-assisted chemical vapor deposition method

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F15%3A43925957" target="_blank" >RIV/49777513:23520/15:43925957 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/46747885:24620/15:00002099

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.tsf.2015.08.017" target="_blank" >http://dx.doi.org/10.1016/j.tsf.2015.08.017</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.tsf.2015.08.017" target="_blank" >10.1016/j.tsf.2015.08.017</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Mechanical characterization of a-C:H:SiOx coatings synthesized using radio-frequency plasma-assisted chemical vapor deposition method

Popis výsledku v původním jazyce

A series of silicone-oxide containing hydrogenated amorphous carbon (a-C:H:SiOx) was deposited on polished silicon substrates by radio-frequency plasma assisted chemical vapour deposition method using methane and hexamethyldisiloxane. Three methane/hexamathyldisiloxane flow ratios and four self-bias voltages were applied for the synthesis of different a-C:H:SiOx coatings having different properties and silicon/oxygen concentrations. The chemical structure of the deposited films was determined by Fourier transform infrared spectroscopy. Detailed characterisation of the mechanical properties of SiOx incorporated carbon coatings was made using the nanoindentation (hardness and modulus) and profillometry (residual stress) methods. Hardness and elastic modulus were used for evaluation of the endurance capability and resistance to plastic deformation. The elastic recovery was calculated based on loading and unloading curves. The residual stress of diamond-like carbon coatings can be effectively reduced by the incorporation of SiOx. The mechanism of reducing the residual stress depending on the applied self-bias voltage is proposed. In the case of all of the examined coatings the addition of SiOx reduces the hardness, while for high self-bias voltages and increase of endurance capability and resistance to plastic deformation is observed.

Název v anglickém jazyce

Mechanical characterization of a-C:H:SiOx coatings synthesized using radio-frequency plasma-assisted chemical vapor deposition method

Popis výsledku anglicky

A series of silicone-oxide containing hydrogenated amorphous carbon (a-C:H:SiOx) was deposited on polished silicon substrates by radio-frequency plasma assisted chemical vapour deposition method using methane and hexamethyldisiloxane. Three methane/hexamathyldisiloxane flow ratios and four self-bias voltages were applied for the synthesis of different a-C:H:SiOx coatings having different properties and silicon/oxygen concentrations. The chemical structure of the deposited films was determined by Fourier transform infrared spectroscopy. Detailed characterisation of the mechanical properties of SiOx incorporated carbon coatings was made using the nanoindentation (hardness and modulus) and profillometry (residual stress) methods. Hardness and elastic modulus were used for evaluation of the endurance capability and resistance to plastic deformation. The elastic recovery was calculated based on loading and unloading curves. The residual stress of diamond-like carbon coatings can be effectively reduced by the incorporation of SiOx. The mechanism of reducing the residual stress depending on the applied self-bias voltage is proposed. In the case of all of the examined coatings the addition of SiOx reduces the hardness, while for high self-bias voltages and increase of endurance capability and resistance to plastic deformation is observed.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

JJ - Ostatní materiály

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2015

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Thin Solid Films

ISSN

0040-6090

e-ISSN

—

Svazek periodika

590

Číslo periodika v rámci svazku

SEP 1

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

7

Strana od-do

299-305

Kód UT WoS článku

000361057100045

EID výsledku v databázi Scopus

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