Effect of the Si content on the microstructure of hard, multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F15%3A43926780" target="_blank" >RIV/49777513:23520/15:43926780 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.apsusc.2015.09.249" target="_blank" >http://dx.doi.org/10.1016/j.apsusc.2015.09.249</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apsusc.2015.09.249" target="_blank" >10.1016/j.apsusc.2015.09.249</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Effect of the Si content on the microstructure of hard, multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering

Popis výsledku v původním jazyce

Pulsed magnetron sputtering in pure Ar was used to deposit multifunctional Hf-B-Si-C films with a chemical composition in at% Hf27B57C8, Hf23B55Si2C11, Hf22B54Si9C9 and Hf21B28Si35C7. The effect of Si content in the microstructure evolution of the filmswas studied by X-ray photoelectron spectroscopy, X-ray diffraction, electron diffraction and high-resolution transmission electron microscopy. The Hf27B57C8 film is composed of hexagonal HfB2 nano-columnar structures (~ 50-60 nm long, and ~ 5-10 nm wide). The Hf23B55Si2C11 film consists of finer HfB2 nanocrystal columnar structures (~ 20-30 nm long and < 5 nm wide) concealed by ~ 1 nm thick amorphous boundaries. Further incorporation of Si into the films results in microstructural refinement and promotes the formation of an amorphous structure. As the Si content increases, the size of the HfB2 nanocrystals decreases from 50-60 nm down to 1-2 nm and the nanocrystals become randomly oriented. This is consistent with the observed reduction

Název v anglickém jazyce

Effect of the Si content on the microstructure of hard, multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering

Popis výsledku anglicky

Pulsed magnetron sputtering in pure Ar was used to deposit multifunctional Hf-B-Si-C films with a chemical composition in at% Hf27B57C8, Hf23B55Si2C11, Hf22B54Si9C9 and Hf21B28Si35C7. The effect of Si content in the microstructure evolution of the filmswas studied by X-ray photoelectron spectroscopy, X-ray diffraction, electron diffraction and high-resolution transmission electron microscopy. The Hf27B57C8 film is composed of hexagonal HfB2 nano-columnar structures (~ 50-60 nm long, and ~ 5-10 nm wide). The Hf23B55Si2C11 film consists of finer HfB2 nanocrystal columnar structures (~ 20-30 nm long and < 5 nm wide) concealed by ~ 1 nm thick amorphous boundaries. Further incorporation of Si into the films results in microstructural refinement and promotes the formation of an amorphous structure. As the Si content increases, the size of the HfB2 nanocrystals decreases from 50-60 nm down to 1-2 nm and the nanocrystals become randomly oriented. This is consistent with the observed reduction

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

JI - Kompositní materiály

OECD FORD obor

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Projekt

<a href="/cs/project/GA14-03875S" target="_blank" >GA14-03875S: Nanostrukturní multifunkční povlaky připravené užitím silně ionizovaného pulzního plazmatu</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2015

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

APPLIED SURFACE SCIENCE

ISSN

0169-4332

e-ISSN

—

Svazek periodika

357

Číslo periodika v rámci svazku

Part B, 1 December 2015

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

12

Strana od-do

1343-1354

Kód UT WoS článku

000366219700005

EID výsledku v databázi Scopus

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