Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F14%3A43922810" target="_blank" >RIV/49777513:23520/14:43922810 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.surfcoat.2013.12.007" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2013.12.007</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2013.12.007" target="_blank" >10.1016/j.surfcoat.2013.12.007</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering

Popis výsledku v původním jazyce

Hf-B-Si-C films were deposited onto silicon and glass substrates using pulsed magnetron co-sputtering of a single B4C-Hf-Si target (at a fixed 15% Hf fraction and a varying 0-50% Si fraction in the target erosion area) in pure argon. We focus on the effect of the Si content in the films. The film structure changes from nanocolumnar (at 0-7 at.% of Si) to nanocomposite (at around 10 at.% of Si) to amorphous (at higher Si contents). Both nanocolumnar and nanocomposite HfB2-based films exhibit a hardness of up to 37 GPa and a high H/E* ratio of around 0.15. The Si incorporation leads to a significant reduction of the compressive stress of films and improvement of their oxidation resistance (unmeasurable mass change after annealing up to 800 °C at 35 at.%of Si). All films exhibit a high electrical conductivity and very smooth defect-free surfaces with an average roughness below 1 nm. Consequently, the films may be used as a new class of hard and electrically conductive protective coatings

Název v anglickém jazyce

Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering

Popis výsledku anglicky

Hf-B-Si-C films were deposited onto silicon and glass substrates using pulsed magnetron co-sputtering of a single B4C-Hf-Si target (at a fixed 15% Hf fraction and a varying 0-50% Si fraction in the target erosion area) in pure argon. We focus on the effect of the Si content in the films. The film structure changes from nanocolumnar (at 0-7 at.% of Si) to nanocomposite (at around 10 at.% of Si) to amorphous (at higher Si contents). Both nanocolumnar and nanocomposite HfB2-based films exhibit a hardness of up to 37 GPa and a high H/E* ratio of around 0.15. The Si incorporation leads to a significant reduction of the compressive stress of films and improvement of their oxidation resistance (unmeasurable mass change after annealing up to 800 °C at 35 at.%of Si). All films exhibit a high electrical conductivity and very smooth defect-free surfaces with an average roughness below 1 nm. Consequently, the films may be used as a new class of hard and electrically conductive protective coatings

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/GA14-03875S" target="_blank" >GA14-03875S: Nanostrukturní multifunkční povlaky připravené užitím silně ionizovaného pulzního plazmatu</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

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Svazek periodika

2014

Číslo periodika v rámci svazku

257

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

7

Strana od-do

301-307

Kód UT WoS článku

000344423100030

EID výsledku v databázi Scopus

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