Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F13%3A43917535" target="_blank" >RIV/49777513:23520/13:43917535 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61389005:_____/13:00391549

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.surfcoat.2012.08.084" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2012.08.084</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2012.08.084" target="_blank" >10.1016/j.surfcoat.2012.08.084</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering

Popis výsledku v původním jazyce

Hard Zr-B-C-(N) films were deposited on Si(100) substrates by pulsed magnetron co-sputtering of a single boron carbide-zirconium target in various nitrogen-argon gas mixtures. The target was formed by a boron carbide plate overlapped by zirconium stripeswhich covered 15 or 45 % of the target erosion area. The nitrogen fractions in the gas mixture were in the range from 0 to 50 % at the total pressure of the gas mixture of 0.5 Pa. Hard (37 GPa) nanocrystalline Zr-B-C-N films with very low compressive stress (0.4 GPa) and high electrical conductivity (resistivity of 2.3 microohmmeter) were deposited in argon discharge at the 15 % Zr fraction in the target erosion area. Hard (37 GPa) nanocomposite Zr-B-C-N films with low compressive stress (0.6 GPa) andeven higher electrical conductivity (resistivity of 1.7 microohmmeter) were deposited at the 45 % Zr fraction in the target erosion area and 5 % nitrogen fraction in the gas mixture. The former films exhibited very high oxidation resistan

Název v anglickém jazyce

Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering

Popis výsledku anglicky

Hard Zr-B-C-(N) films were deposited on Si(100) substrates by pulsed magnetron co-sputtering of a single boron carbide-zirconium target in various nitrogen-argon gas mixtures. The target was formed by a boron carbide plate overlapped by zirconium stripeswhich covered 15 or 45 % of the target erosion area. The nitrogen fractions in the gas mixture were in the range from 0 to 50 % at the total pressure of the gas mixture of 0.5 Pa. Hard (37 GPa) nanocrystalline Zr-B-C-N films with very low compressive stress (0.4 GPa) and high electrical conductivity (resistivity of 2.3 microohmmeter) were deposited in argon discharge at the 15 % Zr fraction in the target erosion area. Hard (37 GPa) nanocomposite Zr-B-C-N films with low compressive stress (0.6 GPa) andeven higher electrical conductivity (resistivity of 1.7 microohmmeter) were deposited at the 45 % Zr fraction in the target erosion area and 5 % nitrogen fraction in the gas mixture. The former films exhibited very high oxidation resistan

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2013

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface & Coatings Technology

ISSN

0257-8972

e-ISSN

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Svazek periodika

215

Číslo periodika v rámci svazku

1

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

6

Strana od-do

186-191

Kód UT WoS článku

000315659600027

EID výsledku v databázi Scopus

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