Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F13%3A43918474" target="_blank" >RIV/49777513:23520/13:43918474 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.surfcoat.2013.03.033" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2013.03.033</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2013.03.033" target="_blank" >10.1016/j.surfcoat.2013.03.033</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency

Popis výsledku v původním jazyce

Multifunctional Si-B-C-N films with exceptionally high thermal stability are becoming increasingly attractive because of their potential applications in coating technologies, and in high-temperature electronics and optoelectronics. In the present work, amorphous Si-B-C-N films were deposited onto SiC and Cu floating substrates using pulsed dc magnetron co-sputtering of a single boron carbide (25%)-silicon (75 %) target in an argon-nitrogen gas mixture. High-quality defect-free films with smooth surfaces(average roughness of 4 nm) were produced. The films exhibited a hardness of 22 GPa, an effective Young's modulus of 170 GPa and an elastic recovery of 75%. The oxidation resistance of the Si-B-C-N films in air was found to be very high up to 1600 °C. Annealing of the as-deposited films in He to 1400 °C led to a slight decrease in the refractive index from 1.92 to 1.91 and to an increase in the extinction coefficient from 0.0003 to 0.003 (both at the wavelength of 550 nm).

Název v anglickém jazyce

Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency

Popis výsledku anglicky

Multifunctional Si-B-C-N films with exceptionally high thermal stability are becoming increasingly attractive because of their potential applications in coating technologies, and in high-temperature electronics and optoelectronics. In the present work, amorphous Si-B-C-N films were deposited onto SiC and Cu floating substrates using pulsed dc magnetron co-sputtering of a single boron carbide (25%)-silicon (75 %) target in an argon-nitrogen gas mixture. High-quality defect-free films with smooth surfaces(average roughness of 4 nm) were produced. The films exhibited a hardness of 22 GPa, an effective Young's modulus of 170 GPa and an elastic recovery of 75%. The oxidation resistance of the Si-B-C-N films in air was found to be very high up to 1600 °C. Annealing of the as-deposited films in He to 1400 °C led to a slight decrease in the refractive index from 1.92 to 1.91 and to an increase in the extinction coefficient from 0.0003 to 0.003 (both at the wavelength of 550 nm).

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BL - Fyzika plasmatu a výboje v plynech

OECD FORD obor

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Projekt

<a href="/cs/project/GAP108%2F12%2F0393" target="_blank" >GAP108/12/0393: Tvrdé nanokompozitní vrstvy se zvýšenou houževnatostí a unikátními vlastnostmi</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2013

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface & Coatings Technology

ISSN

0257-8972

e-ISSN

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Svazek periodika

226

Číslo periodika v rámci svazku

1

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

6

Strana od-do

34-39

Kód UT WoS článku

000320415400006

EID výsledku v databázi Scopus

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