Magnetron sputtered Hf–B–Si–C–N films with controlled electrical conductivity and optical transparency, and with ultrahigh oxidation resistance

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F18%3A43951132" target="_blank" >RIV/49777513:23520/18:43951132 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61389005:_____/18:00489160

Výsledek na webu

<a href="https://doi.org/10.1016/j.tsf.2018.03.064" target="_blank" >https://doi.org/10.1016/j.tsf.2018.03.064</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.tsf.2018.03.064" target="_blank" >10.1016/j.tsf.2018.03.064</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Magnetron sputtered Hf–B–Si–C–N films with controlled electrical conductivity and optical transparency, and with ultrahigh oxidation resistance

Popis výsledku v původním jazyce

The paper deals with Hf–B–Si–C–N films deposited onto Si and SiC substrates using pulsed magnetron co-sputtering of a single B4C–Hf–Si target (at a fixed 15% Hf and 20% Si fractions in the target erosion area) in nitrogen–argon gas mixtures. We focus on the effect of the nitrogen fraction in the gas mixture (in the range from 0% to 50%) and of the duty cycle (85% and 50%) on the structure and properties of the films. We show that increasing nitrogen fraction in the gas mixture and consequently in the films (up to 52 at.%) results in a strong amorphization of the film structure, decrease in the hardness, rapid rise in the electrical resistivity and in the optical transparency, and increasing onset temperature of the oxidation. For two selected compositions, one electrically conductive and one optically transparent, we show their oxidation resistance up to as much as 1600 °C. The results are important for designing high-temperature protective coatings of electronic and optical elements, and sensors for severe oxidation environments.

Název v anglickém jazyce

Magnetron sputtered Hf–B–Si–C–N films with controlled electrical conductivity and optical transparency, and with ultrahigh oxidation resistance

Popis výsledku anglicky

The paper deals with Hf–B–Si–C–N films deposited onto Si and SiC substrates using pulsed magnetron co-sputtering of a single B4C–Hf–Si target (at a fixed 15% Hf and 20% Si fractions in the target erosion area) in nitrogen–argon gas mixtures. We focus on the effect of the nitrogen fraction in the gas mixture (in the range from 0% to 50%) and of the duty cycle (85% and 50%) on the structure and properties of the films. We show that increasing nitrogen fraction in the gas mixture and consequently in the films (up to 52 at.%) results in a strong amorphization of the film structure, decrease in the hardness, rapid rise in the electrical resistivity and in the optical transparency, and increasing onset temperature of the oxidation. For two selected compositions, one electrically conductive and one optically transparent, we show their oxidation resistance up to as much as 1600 °C. The results are important for designing high-temperature protective coatings of electronic and optical elements, and sensors for severe oxidation environments.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2018

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Thin Solid Films

ISSN

0040-6090

e-ISSN

—

Svazek periodika

653

Číslo periodika v rámci svazku

1 MAY 2018

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

8

Strana od-do

333-340

Kód UT WoS článku

000429409800045

EID výsledku v databázi Scopus

2-s2.0-85044437447