Return of target material ions leads to a reduced hysteresis in reactive high power impulse magnetron sputtering: Experiment

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F17%3A43931741" target="_blank" >RIV/49777513:23520/17:43931741 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1063/1.4977816" target="_blank" >http://dx.doi.org/10.1063/1.4977816</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1063/1.4977816" target="_blank" >10.1063/1.4977816</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Return of target material ions leads to a reduced hysteresis in reactive high power impulse magnetron sputtering: Experiment

Popis výsledku v původním jazyce

Titanium and aluminum targets have been reactively sputtered in Ar+O2 or Ar+N2 gas mixtures in order to systematically investigate the effect of reduced hysteresis in reactive high power impulse magnetron sputtering (HiPIMS) as compared to other sputtering techniques utilizing low discharge target power density (e.g., direct current or pulsed direct current mid-frequency magnetron sputtering) operated at the same average discharge power. We found that the negative slope of the flow rate of the reactive gas gettered by the sputtered target material as a function of the reactive gas partial pressure is clearly lower in case of HiPIMS. This results in a lower critical pumping speed, which implies a reduced hysteresis. We argue that the most important effect explaining the observed behavior is covering of the reacted areas of the target by the returning ionized metal, effectively lowering the target coverage at a given partial pressure. This explanation is supported by a calculation using an analytical model of reactive HiPIMS with time and space averaging (developed by us).

Název v anglickém jazyce

Return of target material ions leads to a reduced hysteresis in reactive high power impulse magnetron sputtering: Experiment

Popis výsledku anglicky

Titanium and aluminum targets have been reactively sputtered in Ar+O2 or Ar+N2 gas mixtures in order to systematically investigate the effect of reduced hysteresis in reactive high power impulse magnetron sputtering (HiPIMS) as compared to other sputtering techniques utilizing low discharge target power density (e.g., direct current or pulsed direct current mid-frequency magnetron sputtering) operated at the same average discharge power. We found that the negative slope of the flow rate of the reactive gas gettered by the sputtered target material as a function of the reactive gas partial pressure is clearly lower in case of HiPIMS. This results in a lower critical pumping speed, which implies a reduced hysteresis. We argue that the most important effect explaining the observed behavior is covering of the reacted areas of the target by the returning ionized metal, effectively lowering the target coverage at a given partial pressure. This explanation is supported by a calculation using an analytical model of reactive HiPIMS with time and space averaging (developed by us).

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

<a href="/cs/project/EE2.3.30.0013" target="_blank" >EE2.3.30.0013: Excelence lidských zdrojů jako zdroj konkurenceschopnosti</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Applied Physics

ISSN

0021-8979

e-ISSN

—

Svazek periodika

121

Číslo periodika v rámci svazku

17

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

10

Strana od-do

„171911-1“-„171911-10“

Kód UT WoS článku

000400623700013

EID výsledku v databázi Scopus

2-s2.0-85015409736