Studies of hysteresis effect in reactive HiPIMS deposition of oxides

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F11%3A00183741" target="_blank" >RIV/68407700:21230/11:00183741 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.surfcoat.2011.01.019" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2011.01.019</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2011.01.019" target="_blank" >10.1016/j.surfcoat.2011.01.019</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Studies of hysteresis effect in reactive HiPIMS deposition of oxides

Popis výsledku v původním jazyce

High power impulse magnetron sputtering (HiPIMS) has proven to be capable of substantial improvement of the quality of deposited coatings. Lately, there have been a number of reports indicating that the hysteresis effect may be reduced in HiPIMS mode resulting in an increase of the deposition rate of stoichiometric compound as compared to a direct current magnetron sputtering process in oxide mode. In this contribution, we have studied the hysteresis behaviour of Ti metal targets sputtered in Ar+O2 mixtures. For fixed pulse on time and a constant average power, there is an optimum frequency minimizing the hysteresis. The effect of gas dynamics was analyzed by measurements of the gas refill time and rarefaction. Results indicate that the gas rarefactionmay be responsible for the observed hysteresis behaviour. The results are in agreement with a previous study of Al oxide reactive process.

Název v anglickém jazyce

Studies of hysteresis effect in reactive HiPIMS deposition of oxides

Popis výsledku anglicky

High power impulse magnetron sputtering (HiPIMS) has proven to be capable of substantial improvement of the quality of deposited coatings. Lately, there have been a number of reports indicating that the hysteresis effect may be reduced in HiPIMS mode resulting in an increase of the deposition rate of stoichiometric compound as compared to a direct current magnetron sputtering process in oxide mode. In this contribution, we have studied the hysteresis behaviour of Ti metal targets sputtered in Ar+O2 mixtures. For fixed pulse on time and a constant average power, there is an optimum frequency minimizing the hysteresis. The effect of gas dynamics was analyzed by measurements of the gas refill time and rarefaction. Results indicate that the gas rarefactionmay be responsible for the observed hysteresis behaviour. The results are in agreement with a previous study of Al oxide reactive process.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

JI - Kompositní materiály

OECD FORD obor

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Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2011

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

—

Svazek periodika

205

Číslo periodika v rámci svazku

2

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

4

Strana od-do

303-306

Kód UT WoS článku

000293258600065

EID výsledku v databázi Scopus

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