Study of the high-temperature oxidation resistance mechanism of magnetron sputtered Hf7B23Si17C4N45 film

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F18%3A43949540" target="_blank" >RIV/49777513:23520/18:43949540 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1116/1.5004145" target="_blank" >https://doi.org/10.1116/1.5004145</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1116/1.5004145" target="_blank" >10.1116/1.5004145</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Study of the high-temperature oxidation resistance mechanism of magnetron sputtered Hf7B23Si17C4N45 film

Popis výsledku v původním jazyce

The microstructure evolution and high temperature oxidation mechanism of a hard, amorphous, and optically transparent Hf7B23Si17C4N45 film was studied by x-ray diffraction and transmission electron microscopy. The Hf7B23Si17C4N45 films were deposited by reactive pulse dc magnetron sputtering and annealed in air at temperatures from 1100 to 1500 °C. All annealed films were found to have a two-layered structure composed of the original amorphous and homogeneous layer followed by a nanocomposite oxidized surface layer. The top nanocomposite layer consists of an amorphous SiOx-based matrix and a population of HfO2 nanoparticles with two distinct sublayers. The first sublayer is next to the original amorphous layer and has a dense population of small HfO2 nanoparticles (up to several nanometers) followed by a surface sublayer with coarsened and dispersed HfO2 nanoparticles (up to several tens nm). The HfO2 nanoparticles in the bottom sublayer form by a nucleation and growth process whereas the ones in the surface sublayer coarsen via Ostwald ripening. An estimate of the activation energy for oxygen diffusion through the oxidized layer produced a value around 3.43 eV attesting to the high oxidation resistance of the film. The oxidation resistance mechanism is attributed to the precipitation of HfO2 nanoparticles within a dense SiOx-based matrix and quartz SiO2 in front of the base layer interface that can act as a barrier to heat transfer and O diffusion.

Název v anglickém jazyce

Study of the high-temperature oxidation resistance mechanism of magnetron sputtered Hf7B23Si17C4N45 film

Popis výsledku anglicky

The microstructure evolution and high temperature oxidation mechanism of a hard, amorphous, and optically transparent Hf7B23Si17C4N45 film was studied by x-ray diffraction and transmission electron microscopy. The Hf7B23Si17C4N45 films were deposited by reactive pulse dc magnetron sputtering and annealed in air at temperatures from 1100 to 1500 °C. All annealed films were found to have a two-layered structure composed of the original amorphous and homogeneous layer followed by a nanocomposite oxidized surface layer. The top nanocomposite layer consists of an amorphous SiOx-based matrix and a population of HfO2 nanoparticles with two distinct sublayers. The first sublayer is next to the original amorphous layer and has a dense population of small HfO2 nanoparticles (up to several nanometers) followed by a surface sublayer with coarsened and dispersed HfO2 nanoparticles (up to several tens nm). The HfO2 nanoparticles in the bottom sublayer form by a nucleation and growth process whereas the ones in the surface sublayer coarsen via Ostwald ripening. An estimate of the activation energy for oxygen diffusion through the oxidized layer produced a value around 3.43 eV attesting to the high oxidation resistance of the film. The oxidation resistance mechanism is attributed to the precipitation of HfO2 nanoparticles within a dense SiOx-based matrix and quartz SiO2 in front of the base layer interface that can act as a barrier to heat transfer and O diffusion.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/GA17-08944S" target="_blank" >GA17-08944S: Nanostrukturní povlaky syntetizované užitím vysoce reaktivního pulzního plazmatu</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2018

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Vacuum Science and Technology A

ISSN

0734-2101

e-ISSN

—

Svazek periodika

36

Číslo periodika v rámci svazku

2

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

13

Strana od-do

"021505-1"-"021505-13"

Kód UT WoS článku

000426978500030

EID výsledku v databázi Scopus

2-s2.0-85037718796