Tuning properties and behavior of magnetron sputtered Zr–Hf–Cu metallic glasses

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F18%3A43949733" target="_blank" >RIV/49777513:23520/18:43949733 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.jallcom.2017.12.301" target="_blank" >http://dx.doi.org/10.1016/j.jallcom.2017.12.301</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.jallcom.2017.12.301" target="_blank" >10.1016/j.jallcom.2017.12.301</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Tuning properties and behavior of magnetron sputtered Zr–Hf–Cu metallic glasses

Popis výsledku v původním jazyce

Amorphous ternary Zr–Hf–Cu thin-film alloys with glass-like behavior were deposited by non-reactive conventional dc and high-power impulse magnetron co-sputtering using three unbalanced magnetrons equipped with Zr, Hf and Cu targets. The Zr and Hf targets were operated in a dc regime while the Cu target in a high power impulse regime. Two series of films with a gradually increasing Hf/(Hf+Zr) ratio at 46 at.% Cu and 59 at.% Cu were deposited. The effect of the elemental composition on the structure, thermal behavior, mechanical and surface properties, electrical resistivity and oxidation resistance was systematically investigated. We found a clear correlation among the evolution of the glass transition temperature, crystallization temperature, hardness and effective Young&apos;s modulus with increasing Hf/(Hf+Zr) ratio. A linear increase of these quantities is attributed to an increase of the average bond energy in the films as Hf gradually substitutes Zr. The Zr–Hf–Cu thin-film metallic glasses exhibit enhanced hardness (up to 7.8 GPa), enhanced thermal stability and oxidation resistance, very smooth (surface roughness down to 0.2 nm) and hydrophobic surface (water contact angle up to 109°), and very low electrical resistivity (lower than 1.9 μΩm).

Název v anglickém jazyce

Tuning properties and behavior of magnetron sputtered Zr–Hf–Cu metallic glasses

Popis výsledku anglicky

Amorphous ternary Zr–Hf–Cu thin-film alloys with glass-like behavior were deposited by non-reactive conventional dc and high-power impulse magnetron co-sputtering using three unbalanced magnetrons equipped with Zr, Hf and Cu targets. The Zr and Hf targets were operated in a dc regime while the Cu target in a high power impulse regime. Two series of films with a gradually increasing Hf/(Hf+Zr) ratio at 46 at.% Cu and 59 at.% Cu were deposited. The effect of the elemental composition on the structure, thermal behavior, mechanical and surface properties, electrical resistivity and oxidation resistance was systematically investigated. We found a clear correlation among the evolution of the glass transition temperature, crystallization temperature, hardness and effective Young&apos;s modulus with increasing Hf/(Hf+Zr) ratio. A linear increase of these quantities is attributed to an increase of the average bond energy in the films as Hf gradually substitutes Zr. The Zr–Hf–Cu thin-film metallic glasses exhibit enhanced hardness (up to 7.8 GPa), enhanced thermal stability and oxidation resistance, very smooth (surface roughness down to 0.2 nm) and hydrophobic surface (water contact angle up to 109°), and very low electrical resistivity (lower than 1.9 μΩm).

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/GA16-18183S" target="_blank" >GA16-18183S: Pokročilé povrchové povlaky se zlepšenými vlastnostmi a teplotní stabilitou</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2018

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

JOURNAL OF ALLOYS AND COMPOUNDS

ISSN

0925-8388

e-ISSN

—

Svazek periodika

739

Číslo periodika v rámci svazku

30 March 2018

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

8

Strana od-do

848-855

Kód UT WoS článku

000425491800101

EID výsledku v databázi Scopus

2-s2.0-85040017906