Effect of energy on macrostress in Ti(Al,V)N films prepared by magnetron sputtering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F18%3A43952053" target="_blank" >RIV/49777513:23520/18:43952053 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1016/j.vacuum.2018.09.038" target="_blank" >https://doi.org/10.1016/j.vacuum.2018.09.038</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.vacuum.2018.09.038" target="_blank" >10.1016/j.vacuum.2018.09.038</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Effect of energy on macrostress in Ti(Al,V)N films prepared by magnetron sputtering

Popis výsledku v původním jazyce

The article reports on the effect of the energy delivered into the growing film on its macrostress, microstructure, mechanical properties and resistance to cracking of Ti(Al,V)N films. The Ti(Al,V)N films were deposited on Si(111) and Mo substrates by magnetron sputtering in a mixture Ar+N2 gases using a dual magnetron with closed magnetic field and equipped with TiAlV (6 at.% Al, 4 at.% V) alloy targets. It is shown that the compressive macrostress in sputtered films can be reduced either by the pulsed bipolar bias voltage with alternating negative and positive pulses or the electron and ion bombardment during overshoots in the pulsed magnetron sputtering. All sputtered films with high ratio H/E* &gt; 0.1, compressive macrostress, and non-columnar microstructure exhibit an enhanced resistance to cracking. The high compressive macrostress in the film is not the necessary condition for the formation of the films with an enhanced resistance to cracking.

Název v anglickém jazyce

Effect of energy on macrostress in Ti(Al,V)N films prepared by magnetron sputtering

Popis výsledku anglicky

The article reports on the effect of the energy delivered into the growing film on its macrostress, microstructure, mechanical properties and resistance to cracking of Ti(Al,V)N films. The Ti(Al,V)N films were deposited on Si(111) and Mo substrates by magnetron sputtering in a mixture Ar+N2 gases using a dual magnetron with closed magnetic field and equipped with TiAlV (6 at.% Al, 4 at.% V) alloy targets. It is shown that the compressive macrostress in sputtered films can be reduced either by the pulsed bipolar bias voltage with alternating negative and positive pulses or the electron and ion bombardment during overshoots in the pulsed magnetron sputtering. All sputtered films with high ratio H/E* &gt; 0.1, compressive macrostress, and non-columnar microstructure exhibit an enhanced resistance to cracking. The high compressive macrostress in the film is not the necessary condition for the formation of the films with an enhanced resistance to cracking.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/LO1506" target="_blank" >LO1506: Podpora udržitelnosti centra NTIS - Nové technologie pro informační společnost</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2018

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Vacuum

ISSN

0042-207X

e-ISSN

—

Svazek periodika

158

Číslo periodika v rámci svazku

DEC 2018

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

8

Strana od-do

52-59

Kód UT WoS článku

000449897400009

EID výsledku v databázi Scopus

2-s2.0-85053814674