Evolution of microstructure and macrostress in sputtered hard Ti(Al,V)N films with increasing energy delivered during their growth by bombarding ions

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F17%3A43931448" target="_blank" >RIV/49777513:23520/17:43931448 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1116/1.4967935" target="_blank" >http://dx.doi.org/10.1116/1.4967935</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1116/1.4967935" target="_blank" >10.1116/1.4967935</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Evolution of microstructure and macrostress in sputtered hard Ti(Al,V)N films with increasing energy delivered during their growth by bombarding ions

Popis výsledku v původním jazyce

This letter reports on the effect of the energy Ebi, delivered to the sputtered Ti(Al,V)N film by bombarding ions, on its microstructure, macrostress, mechanical properties, and resistance to cracking. The films were deposited by reactive magnetron sputtering. Interrelationships between these parameters were investigated in detail. It was shown that (1) the increase of the energy Ebi makes it possible to convert (i) the film microstructure from columnar to dense, noncolumnar, (ii) the macrostress from tensile to compressive, (iii) the brittle hard film with low ratio H/E* &lt; 0.1 and low elastic recovery We &lt; 60% to the flexible hard film with high ratio H/E* ≥ 0.1 and high elastic recovery We ≥ 60%, (2) the flexible hard Ti(Al,V)N films with high ratio H/E* ≥ 0.1, high elastic recovery We ≥ 60% and compressive macrostress can be formed not only in the transition zone (zone T in which the films exhibit a dense, voids-free microstructure) of the Thornton’s structural zone model (SZM) but also in zone 1 in which the films exhibit a columnar microstructure and (3) the line corresponding to the films with zero macrostress in the SZM lies in zone 1 corresponding to the columnar microstructure.

Název v anglickém jazyce

Evolution of microstructure and macrostress in sputtered hard Ti(Al,V)N films with increasing energy delivered during their growth by bombarding ions

Popis výsledku anglicky

This letter reports on the effect of the energy Ebi, delivered to the sputtered Ti(Al,V)N film by bombarding ions, on its microstructure, macrostress, mechanical properties, and resistance to cracking. The films were deposited by reactive magnetron sputtering. Interrelationships between these parameters were investigated in detail. It was shown that (1) the increase of the energy Ebi makes it possible to convert (i) the film microstructure from columnar to dense, noncolumnar, (ii) the macrostress from tensile to compressive, (iii) the brittle hard film with low ratio H/E* &lt; 0.1 and low elastic recovery We &lt; 60% to the flexible hard film with high ratio H/E* ≥ 0.1 and high elastic recovery We ≥ 60%, (2) the flexible hard Ti(Al,V)N films with high ratio H/E* ≥ 0.1, high elastic recovery We ≥ 60% and compressive macrostress can be formed not only in the transition zone (zone T in which the films exhibit a dense, voids-free microstructure) of the Thornton’s structural zone model (SZM) but also in zone 1 in which the films exhibit a columnar microstructure and (3) the line corresponding to the films with zero macrostress in the SZM lies in zone 1 corresponding to the columnar microstructure.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/GA16-18183S" target="_blank" >GA16-18183S: Pokročilé povrchové povlaky se zlepšenými vlastnostmi a teplotní stabilitou</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Vacuum Science and Technology A

ISSN

0734-2101

e-ISSN

—

Svazek periodika

35

Číslo periodika v rámci svazku

2

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

5

Strana od-do

„020601-1“-„020601-5“

Kód UT WoS článku

000397762400001

EID výsledku v databázi Scopus

2-s2.0-84995961465