Effect of positive pulse voltage in bipolar reactive HiPIMS on crystal structure, microstructure and mechanical properties of CrN films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F20%3A43958585" target="_blank" >RIV/49777513:23520/20:43958585 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1016/j.surfcoat.2020.125773" target="_blank" >https://doi.org/10.1016/j.surfcoat.2020.125773</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2020.125773" target="_blank" >10.1016/j.surfcoat.2020.125773</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Effect of positive pulse voltage in bipolar reactive HiPIMS on crystal structure, microstructure and mechanical properties of CrN films

Popis výsledku v původním jazyce

CrN films were prepared using three different configurations of the HiPIMS discharge mode and the substrate holder potential. We investigate the effect of a positive pulse voltage (30–400 V) in bipolar HiPIMS on the crystal structure, microstructure and resulting mechanical properties of the films, and compare it to the effect of a standard DC bias voltage applied to the substrate holder in unipolar HiPIMS. We find that when the substrate holder is at a floating potential, its charging causes the loss of the plasma-substrate potential difference, necessary for ion acceleration, and no obvious evolution is thus observed with increasing positive pulse voltage. However, when the substrate holder is grounded, the effect of the positive pulse voltage is apparent and different from the effect of the DC bias substrate voltage. That is mainly due to differences in energies delivered into the growing film by bombarding ions. Films prepared using bipolar HiPIMS at a positive pulse voltage of 90 and 120 V exhibit the most interesting properties, namely high hardness (23.5 and 23.1 GPa, respectively) at a relatively low residual compressive stress (1.7 and 1.5 GPa, respectively). The results indicate that as long as the growing film is conductively connected with the ground, bipolar HiPIMS is a suitable method to tailor and improve the film properties.

Název v anglickém jazyce

Effect of positive pulse voltage in bipolar reactive HiPIMS on crystal structure, microstructure and mechanical properties of CrN films

Popis výsledku anglicky

CrN films were prepared using three different configurations of the HiPIMS discharge mode and the substrate holder potential. We investigate the effect of a positive pulse voltage (30–400 V) in bipolar HiPIMS on the crystal structure, microstructure and resulting mechanical properties of the films, and compare it to the effect of a standard DC bias voltage applied to the substrate holder in unipolar HiPIMS. We find that when the substrate holder is at a floating potential, its charging causes the loss of the plasma-substrate potential difference, necessary for ion acceleration, and no obvious evolution is thus observed with increasing positive pulse voltage. However, when the substrate holder is grounded, the effect of the positive pulse voltage is apparent and different from the effect of the DC bias substrate voltage. That is mainly due to differences in energies delivered into the growing film by bombarding ions. Films prepared using bipolar HiPIMS at a positive pulse voltage of 90 and 120 V exhibit the most interesting properties, namely high hardness (23.5 and 23.1 GPa, respectively) at a relatively low residual compressive stress (1.7 and 1.5 GPa, respectively). The results indicate that as long as the growing film is conductively connected with the ground, bipolar HiPIMS is a suitable method to tailor and improve the film properties.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/FV30177" target="_blank" >FV30177: Výzkum a vývoj nových pulzních plazmových technologií pro depozici pokročilých tenkovrstvých materiálů</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2020

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

—

Svazek periodika

393

Číslo periodika v rámci svazku

15 JUL 2020

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

7

Strana od-do

„125773-1“-„125773-7“

Kód UT WoS článku

000532676600014

EID výsledku v databázi Scopus

2-s2.0-85083311659