Understanding the ion and atom fluxes during HiPIMS deposition of NbC from a compound target

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F23%3A43970250" target="_blank" >RIV/49777513:23520/23:43970250 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Understanding the ion and atom fluxes during HiPIMS deposition of NbC from a compound target

Popis výsledku v původním jazyce

This study focuses on understanding the plasma processes leading to the transition from C-rich to stoichiometric NbC films. To study the processes, time-averaged mass spectroscopy, spatial-resolved optical emission spectroscopy (OES), and plasma modelling were used to estimate fluxes of Nb and C atoms and ions at various positions within the discharge plasma. Our findings indicate that even at low power densities, the density of Nb ions remains significant, primarily due to their lower ionization energy and larger ionization cross-section compared to C atoms. However, the film growth is driven by the flux of neutral carbon, resulting in excess free carbon in the deposited film. Increasing the pulse power density, and higher ionization efficiencies lead to greater C ionization; however, neutral C still dominates the flux of C species to the film. Ionized C is affected by the back-attraction effect, and neutral C might also be increasingly affected by scattering with Nb. Consequently, this results in the deposition of nearly stoichiometric films using the highest pulse power density and shortest pulse length.

Název v anglickém jazyce

Understanding the ion and atom fluxes during HiPIMS deposition of NbC from a compound target

Popis výsledku anglicky

This study focuses on understanding the plasma processes leading to the transition from C-rich to stoichiometric NbC films. To study the processes, time-averaged mass spectroscopy, spatial-resolved optical emission spectroscopy (OES), and plasma modelling were used to estimate fluxes of Nb and C atoms and ions at various positions within the discharge plasma. Our findings indicate that even at low power densities, the density of Nb ions remains significant, primarily due to their lower ionization energy and larger ionization cross-section compared to C atoms. However, the film growth is driven by the flux of neutral carbon, resulting in excess free carbon in the deposited film. Increasing the pulse power density, and higher ionization efficiencies lead to greater C ionization; however, neutral C still dominates the flux of C species to the film. Ionized C is affected by the back-attraction effect, and neutral C might also be increasingly affected by scattering with Nb. Consequently, this results in the deposition of nearly stoichiometric films using the highest pulse power density and shortest pulse length.

Druh

O - Ostatní výsledky

CEP obor

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OECD FORD obor

20506 - Coating and films

Projekt

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Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2023

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů