Controlled sputter deposition of oxide nanoparticles-based composite thin films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F24%3A43971221" target="_blank" >RIV/49777513:23520/24:43971221 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1016/j.surfcoat.2023.130325" target="_blank" >https://doi.org/10.1016/j.surfcoat.2023.130325</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2023.130325" target="_blank" >10.1016/j.surfcoat.2023.130325</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Controlled sputter deposition of oxide nanoparticles-based composite thin films

Popis výsledku v původním jazyce

This study explores the feasibility of deposition of composite films based on nanoparticles (NPs) using a magnetron-based gas aggregation source of NPs. First, we investigate the deposition conditions and properties of the individual components of the composite films, namely, NPs prepared using Cu and W targets. We thoroughly discuss that the generation of NPs might be more efficient in the Ar atmosphere in the case of W target due to an enhanced direct emission of NP seeds from the target and/or a longer lifetime of the seeds in the plasma. To operate reasonable fluxes of NPs for both targets, O2 was added into the gas mixture. Lower O2 flow rates promote enhanced seed formation of NPs, while higher flow rates exhibit a dominant target poisoning effect, reducing the flux of NPs. We demonstrate that a fine-tuning of O2 flow rate allows us to control the resulting crystal structure of the NPs. Fully oxidized NPs were produced at O2 flow rates of 1.30 sccm and 1.50 sccm for Cu and W targets, respectively. Subsequently, CuO/WO3 composite films were prepared using our in-house-built software as alternating NPs-based layers. To demonstrate the capabilities of the deposition technique, three different CuO/WO3 multilayers were prepared, each with a specific thickness of the individual layers (80 nm, 40 nm, and 10 nm, which corresponds to a monolayer of NPs). Scanning electron microscopy imaging shows well-defined layers with the intended thickness. In addition, XRD analysis confirms that all three multilayers exhibit practically identical patterns, indicating the same volumetric ratio of CuO and WO3 NPs in the investigated films.

Název v anglickém jazyce

Controlled sputter deposition of oxide nanoparticles-based composite thin films

Popis výsledku anglicky

This study explores the feasibility of deposition of composite films based on nanoparticles (NPs) using a magnetron-based gas aggregation source of NPs. First, we investigate the deposition conditions and properties of the individual components of the composite films, namely, NPs prepared using Cu and W targets. We thoroughly discuss that the generation of NPs might be more efficient in the Ar atmosphere in the case of W target due to an enhanced direct emission of NP seeds from the target and/or a longer lifetime of the seeds in the plasma. To operate reasonable fluxes of NPs for both targets, O2 was added into the gas mixture. Lower O2 flow rates promote enhanced seed formation of NPs, while higher flow rates exhibit a dominant target poisoning effect, reducing the flux of NPs. We demonstrate that a fine-tuning of O2 flow rate allows us to control the resulting crystal structure of the NPs. Fully oxidized NPs were produced at O2 flow rates of 1.30 sccm and 1.50 sccm for Cu and W targets, respectively. Subsequently, CuO/WO3 composite films were prepared using our in-house-built software as alternating NPs-based layers. To demonstrate the capabilities of the deposition technique, three different CuO/WO3 multilayers were prepared, each with a specific thickness of the individual layers (80 nm, 40 nm, and 10 nm, which corresponds to a monolayer of NPs). Scanning electron microscopy imaging shows well-defined layers with the intended thickness. In addition, XRD analysis confirms that all three multilayers exhibit practically identical patterns, indicating the same volumetric ratio of CuO and WO3 NPs in the investigated films.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/EH22_008%2F0004572" target="_blank" >EH22_008/0004572: Kvantové materiály pro aplikace v udržitelných technologiích</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2024

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

1879-3347

Svazek periodika

477

Číslo periodika v rámci svazku

15 FEB 2024

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

8

Strana od-do

1-8

Kód UT WoS článku

001149595100001

EID výsledku v databázi Scopus

2-s2.0-85181767782