Nanostructured CuWO4/WO3-x films prepared by reactive magnetron sputtering for hydrogen sensing

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F20%3A43959071" target="_blank" >RIV/49777513:23520/20:43959071 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1016/j.ijhydene.2020.04.203" target="_blank" >https://doi.org/10.1016/j.ijhydene.2020.04.203</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.ijhydene.2020.04.203" target="_blank" >10.1016/j.ijhydene.2020.04.203</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Nanostructured CuWO4/WO3-x films prepared by reactive magnetron sputtering for hydrogen sensing

Popis výsledku v původním jazyce

High-purity films consisting of copper tungstate (CuWO4) and sub-stoichiometric tungsten oxide (WO3-x) were prepared by reactive sputter deposition. An original two-step deposition process was applied for their synthesis. First, a tungsten oxide thin film was deposited by dc magnetron sputtering from a W target in an Ar + O2 gas mixture, afterward, rf sputtering of a Cu target in an Ar + O2 gas mixture was employed to form a discontinuous CuWO4 layer at the top. This results in a formation of nanostructured branched islands of the tungstate. Bilayers with various layer thicknesses were investigated for the sensitivity to hydrogen gas as a conductometric sensor. The sensitivity changes remarkably with the thicknesses of individual layers. The maximum sensitivity was observed for the films with a layer thickness ratio of 5 nm/20 nm. The response was enhanced more than eight times compared to a 20 nm-thick tungsten oxide alone film. An explanation based on the formation of nano-sized n-n junctions is provided. In addition, a microscopy study of the bilayer growth is presented in detail.

Název v anglickém jazyce

Nanostructured CuWO4/WO3-x films prepared by reactive magnetron sputtering for hydrogen sensing

Popis výsledku anglicky

High-purity films consisting of copper tungstate (CuWO4) and sub-stoichiometric tungsten oxide (WO3-x) were prepared by reactive sputter deposition. An original two-step deposition process was applied for their synthesis. First, a tungsten oxide thin film was deposited by dc magnetron sputtering from a W target in an Ar + O2 gas mixture, afterward, rf sputtering of a Cu target in an Ar + O2 gas mixture was employed to form a discontinuous CuWO4 layer at the top. This results in a formation of nanostructured branched islands of the tungstate. Bilayers with various layer thicknesses were investigated for the sensitivity to hydrogen gas as a conductometric sensor. The sensitivity changes remarkably with the thicknesses of individual layers. The maximum sensitivity was observed for the films with a layer thickness ratio of 5 nm/20 nm. The response was enhanced more than eight times compared to a 20 nm-thick tungsten oxide alone film. An explanation based on the formation of nano-sized n-n junctions is provided. In addition, a microscopy study of the bilayer growth is presented in detail.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/GA19-13174S" target="_blank" >GA19-13174S: Pokročilé nanomateriály s řízenou architekturou pro detekci vodíku</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2020

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

INTERNATIONAL JOURNAL OF HYDROGEN ENERGY

ISSN

0360-3199

e-ISSN

—

Svazek periodika

45

Číslo periodika v rámci svazku

35

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

9

Strana od-do

18066-18074

Kód UT WoS článku

000546826200089

EID výsledku v databázi Scopus

2-s2.0-85085604614