Thermally-induced microstructural evolution in nanoparticle-based CuO, WO3 and CuO–WO3 thin films for hydrogen gas sensing

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F25%3A43975828" target="_blank" >RIV/49777513:23520/25:43975828 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/49777513:23640/25:43975828

Výsledek na webu

<a href="https://doi.org/10.1016/j.apsadv.2025.100768" target="_blank" >https://doi.org/10.1016/j.apsadv.2025.100768</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apsadv.2025.100768" target="_blank" >10.1016/j.apsadv.2025.100768</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Thermally-induced microstructural evolution in nanoparticle-based CuO, WO3 and CuO–WO3 thin films for hydrogen gas sensing

Popis výsledku v původním jazyce

This study systematically investigates the microstructural evolution of nanoparticle-based CuO, WO3, and composite CuO–WO3 thin films induced by their post-deposition annealing. The films were reactively deposited using a magnetron-based gas aggregation technique, with the composite films consisting of alternating monolayers of CuO and WO3 nanoparticles. After deposition, the films were annealed in synthetic air at temperatures ranging from 200 to 400 °C and characterized using scanning electron microscopy, X-ray diffraction, Raman spectroscopy, and X-ray photoelectron spectroscopy. Annealing of the CuO films led to the most pronounced changes associated with a gradual enhancement of crystallinity accompanied by significant particle growth with increasing annealing temperature, while the WO3 and CuO–WO3 films were more thermally stable to crystallization and particle growth. Notably, at 400 °C, the CuO–WO3 films crystallized into a novel 𝛾-CuWO4 phase. The annealed films were further evaluated for their gas-sensing performance upon H2 exposure, and the obtained results were analysed in relation to film properties and the microstructural evolution induced by annealing.

Název v anglickém jazyce

Thermally-induced microstructural evolution in nanoparticle-based CuO, WO3 and CuO–WO3 thin films for hydrogen gas sensing

Popis výsledku anglicky

This study systematically investigates the microstructural evolution of nanoparticle-based CuO, WO3, and composite CuO–WO3 thin films induced by their post-deposition annealing. The films were reactively deposited using a magnetron-based gas aggregation technique, with the composite films consisting of alternating monolayers of CuO and WO3 nanoparticles. After deposition, the films were annealed in synthetic air at temperatures ranging from 200 to 400 °C and characterized using scanning electron microscopy, X-ray diffraction, Raman spectroscopy, and X-ray photoelectron spectroscopy. Annealing of the CuO films led to the most pronounced changes associated with a gradual enhancement of crystallinity accompanied by significant particle growth with increasing annealing temperature, while the WO3 and CuO–WO3 films were more thermally stable to crystallization and particle growth. Notably, at 400 °C, the CuO–WO3 films crystallized into a novel 𝛾-CuWO4 phase. The annealed films were further evaluated for their gas-sensing performance upon H2 exposure, and the obtained results were analysed in relation to film properties and the microstructural evolution induced by annealing.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

<a href="/cs/project/EH22_008%2F0004572" target="_blank" >EH22_008/0004572: Kvantové materiály pro aplikace v udržitelných technologiích</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2025

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Surface Science Advances

ISSN

2666-5239

e-ISSN

2666-5239

Svazek periodika

28

Číslo periodika v rámci svazku

AUG 2025

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

11

Strana od-do

nestránkováno

Kód UT WoS článku

001508571400001

EID výsledku v databázi Scopus

2-s2.0-105007060377