Reactive magnetron sputtering of Ni doped ZnO thin film: Investigation of optical, structural, mechanical and magnetic properties

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23640%2F15%3A43925566" target="_blank" >RIV/49777513:23640/15:43925566 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.jallcom.2015.02.142" target="_blank" >http://dx.doi.org/10.1016/j.jallcom.2015.02.142</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.jallcom.2015.02.142" target="_blank" >10.1016/j.jallcom.2015.02.142</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Reactive magnetron sputtering of Ni doped ZnO thin film: Investigation of optical, structural, mechanical and magnetic properties

Popis výsledku v původním jazyce

Nickel doped ZnO (ZnO:Ni) thin films are considered to be promising materials for optoelectronic applications. The doping of transition metal ion modifies the optical and physical properties of the materials. Therefore, studies on optical and physical properties are important for such applications. In the present work, the ZnO:Ni thin films with different Ni concentrations were deposited on Si (100) and corning glass substrates at 400 oC by reactive magnetron sputtering using Ar and O2 gas mixture. The(002) growth plane of the ZnO was identified from the X-ray diffraction experiment. It was also confirmed that the films exhibit strong preferred orientation (texture) of crystalline columns in the direction [001] perpendicular to the substrate surface.The optical transmittance, band gap, and refractive indices of the thin films were studied by UV-Vis spectroscopy, photoluminescence and spectroscopic ellipsometry. The optical band gap and refractive index of the thin films decreased wit

Název v anglickém jazyce

Reactive magnetron sputtering of Ni doped ZnO thin film: Investigation of optical, structural, mechanical and magnetic properties

Popis výsledku anglicky

Nickel doped ZnO (ZnO:Ni) thin films are considered to be promising materials for optoelectronic applications. The doping of transition metal ion modifies the optical and physical properties of the materials. Therefore, studies on optical and physical properties are important for such applications. In the present work, the ZnO:Ni thin films with different Ni concentrations were deposited on Si (100) and corning glass substrates at 400 oC by reactive magnetron sputtering using Ar and O2 gas mixture. The(002) growth plane of the ZnO was identified from the X-ray diffraction experiment. It was also confirmed that the films exhibit strong preferred orientation (texture) of crystalline columns in the direction [001] perpendicular to the substrate surface.The optical transmittance, band gap, and refractive indices of the thin films were studied by UV-Vis spectroscopy, photoluminescence and spectroscopic ellipsometry. The optical band gap and refractive index of the thin films decreased wit

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

—

Projekt

<a href="/cs/project/ED2.1.00%2F03.0088" target="_blank" >ED2.1.00/03.0088: Centrum nových technologií a materiálů (CENTEM)</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2015

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Alloys and Compounds

ISSN

0925-8388

e-ISSN

—

Svazek periodika

636

Číslo periodika v rámci svazku

červenec 2015

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

8

Strana od-do

85-92

Kód UT WoS článku

000351836600014

EID výsledku v databázi Scopus

—