Thickness dependent wetting properties and surface free energy of HfO2 thin films

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23640%2F16%3A43928833" target="_blank" >RIV/49777513:23640/16:43928833 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/49777513:23520/16:43928833

Výsledek na webu

<a href="http://dx.doi.org/10.1063/1.4953262" target="_blank" >http://dx.doi.org/10.1063/1.4953262</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1063/1.4953262" target="_blank" >10.1063/1.4953262</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Thickness dependent wetting properties and surface free energy of HfO2 thin films

Popis výsledku v původním jazyce

We show here that intrinsic hydrophobicity of HfO2 thin films can be easily tuned by the variation of film thickness. We used the reactive high-power impulse magnetron sputtering for preparation of high-quality HfO2 films with smooth topography and well-controlled thickness. Results show a strong dependence of wetting properties on the thickness of the film in the range of 50-250 nm due to the dominance of the electrostatic Lifshitz-van der Waals component of the surface free energy. We have found the water droplet contact angle ranging from ALMOST EQUAL TO120o for the thickness of 50 nm to 100o for the thickness of 2300 nm. At the same time the surface free energy grows from ALMOST EQUAL TO25 mJ/m^2 for the thickness of 50 nm to ALMOST EQUAL TO33 mJ/m^2 for the thickness of 2300 nm. We propose two explanations for the observed thickness dependence of the wetting properties: influence of the non-dominant texture and/or non-monotonic size dependence of the particle surface energy.

Název v anglickém jazyce

Thickness dependent wetting properties and surface free energy of HfO2 thin films

Popis výsledku anglicky

We show here that intrinsic hydrophobicity of HfO2 thin films can be easily tuned by the variation of film thickness. We used the reactive high-power impulse magnetron sputtering for preparation of high-quality HfO2 films with smooth topography and well-controlled thickness. Results show a strong dependence of wetting properties on the thickness of the film in the range of 50-250 nm due to the dominance of the electrostatic Lifshitz-van der Waals component of the surface free energy. We have found the water droplet contact angle ranging from ALMOST EQUAL TO120o for the thickness of 50 nm to 100o for the thickness of 2300 nm. At the same time the surface free energy grows from ALMOST EQUAL TO25 mJ/m^2 for the thickness of 50 nm to ALMOST EQUAL TO33 mJ/m^2 for the thickness of 2300 nm. We propose two explanations for the observed thickness dependence of the wetting properties: influence of the non-dominant texture and/or non-monotonic size dependence of the particle surface energy.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

JJ - Ostatní materiály

OECD FORD obor

—

Projekt

—

Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2016

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

APPLIED PHYSICS LETTERS

ISSN

0003-6951

e-ISSN

—

Svazek periodika

108

Číslo periodika v rámci svazku

23

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

5

Strana od-do

'231602-1'-'231602-5'

Kód UT WoS článku

000378924700010

EID výsledku v databázi Scopus

2-s2.0-84974529225