Reactive sputtering deposition of plasma polymerized nylon films with embedded NHx groups

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60076658%3A12310%2F19%3A43899009" target="_blank" >RIV/60076658:12310/19:43899009 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216208:11320/19:10403914

Výsledek na webu

<a href="https://reader.elsevier.com/reader/sd/pii/S0257897219301914?token=F26212FE717058439174449A0B1C3661C4374A1412E5C13BA02126173BD8237C1F75471A0577952B4985D4D5A1B29471" target="_blank" >https://reader.elsevier.com/reader/sd/pii/S0257897219301914?token=F26212FE717058439174449A0B1C3661C4374A1412E5C13BA02126173BD8237C1F75471A0577952B4985D4D5A1B29471</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2019.02.046" target="_blank" >10.1016/j.surfcoat.2019.02.046</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Reactive sputtering deposition of plasma polymerized nylon films with embedded NHx groups

Popis výsledku v původním jazyce

Reactive magnetron sputtering deposition of plasma polymer film enriched by nitrogen-containing functional groups (NCFGs) was investigated. The main goal of our research is to obtain plasma polymerized nylon films prepared by rf magnetron sputtering with embedded -NHx functional groups in its volume. Those films can be used as &quot;storage environment&quot; for many chemical substances (for example, antibiotics) that need the presence of chemical grafts. Films were prepared in ternary process gas mixture of Ar (carrier gas), and N-2:C2H2 (reactive component). We found that a small amount of acetylene added in the process gas results in an increased amount of NCFGs while keeping the deposited film stable in aqueous environments. However, an enhanced amount of acetylene in the process gas, above some certain limit, causes target poisoning and suppression of the nylon sputtering which practically results in the conversion of the deposition process to PECVD. When the deposition was done in a reactive atmosphere only (N-2:C2H2), the required optimum flow of acetylene to incorporate maximum NCFGs into the film volume raised, but it had a negative effect on the film stability in water.

Název v anglickém jazyce

Reactive sputtering deposition of plasma polymerized nylon films with embedded NHx groups

Popis výsledku anglicky

Reactive magnetron sputtering deposition of plasma polymer film enriched by nitrogen-containing functional groups (NCFGs) was investigated. The main goal of our research is to obtain plasma polymerized nylon films prepared by rf magnetron sputtering with embedded -NHx functional groups in its volume. Those films can be used as &quot;storage environment&quot; for many chemical substances (for example, antibiotics) that need the presence of chemical grafts. Films were prepared in ternary process gas mixture of Ar (carrier gas), and N-2:C2H2 (reactive component). We found that a small amount of acetylene added in the process gas results in an increased amount of NCFGs while keeping the deposited film stable in aqueous environments. However, an enhanced amount of acetylene in the process gas, above some certain limit, causes target poisoning and suppression of the nylon sputtering which practically results in the conversion of the deposition process to PECVD. When the deposition was done in a reactive atmosphere only (N-2:C2H2), the required optimum flow of acetylene to incorporate maximum NCFGs into the film volume raised, but it had a negative effect on the film stability in water.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

<a href="/cs/project/GA19-20168S" target="_blank" >GA19-20168S: Nanostruktury pro LSPR senzory na optickém vlákně</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2019

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

—

Svazek periodika

363

Číslo periodika v rámci svazku

APR 15 2019

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

8

Strana od-do

120-127

Kód UT WoS článku

000462421600016

EID výsledku v databázi Scopus

2-s2.0-85061692444