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Germination Improvement of Three Pine Species (Pinus) After Diffuse Coplanar Surface Barrier Discharge Plasma Treatment

Identifikátory výsledku

  • Kód výsledku v IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60076658%3A12410%2F20%3A43902116" target="_blank" >RIV/60076658:12410/20:43902116 - isvavai.cz</a>

  • Nalezeny alternativní kódy

    RIV/60076658:12410/21:43903793

  • Výsledek na webu

    <a href="https://link.springer.com/article/10.1007%2Fs11090-020-10128-5" target="_blank" >https://link.springer.com/article/10.1007%2Fs11090-020-10128-5</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1007/s11090-020-10128-5" target="_blank" >10.1007/s11090-020-10128-5</a>

Alternativní jazyky

  • Jazyk výsledku

    angličtina

  • Název v původním jazyce

    Germination Improvement of Three Pine Species (Pinus) After Diffuse Coplanar Surface Barrier Discharge Plasma Treatment

  • Popis výsledku v původním jazyce

    Seed modification by atmospheric non-thermal plasma treatment was tested on pine species. The Diffuse Coplanar Surface Barrier Discharge (DCSBD) with expose times of 0 s, 1 s, 3 s, 5 s, 10 s, 30 s, 60 s was used on seed treatment of Pinus sylvestris, P. nigra and P. mugo. The effect of plasma treatment on the chemical bonds on the seed surface was studied using the Attenuated Total Reflectance – Fourier Transform Infrared Spectroscopy (ATR-FTIR). Characteristics of seed germination and early growth were measured. ATR – FTIR surface diagnostics did not show any damage. Various statistically significant effects of the three species of seeds treated with DCSBD treatment were recorded. No significant differences were found between control sample and plasma treated ones, but some positive trends were obtained. Positive trends were recorded in germinated and growing seeds of all three species after 3 s exposures above all. Exposure times from 10 s had an inhibitory effect. Based on the results obtained, it can be recommended that forest nurseries performance of nonthermal plasma modification of seeds should be evaluated to measure the durability of the observed growth characteristics.

  • Název v anglickém jazyce

    Germination Improvement of Three Pine Species (Pinus) After Diffuse Coplanar Surface Barrier Discharge Plasma Treatment

  • Popis výsledku anglicky

    Seed modification by atmospheric non-thermal plasma treatment was tested on pine species. The Diffuse Coplanar Surface Barrier Discharge (DCSBD) with expose times of 0 s, 1 s, 3 s, 5 s, 10 s, 30 s, 60 s was used on seed treatment of Pinus sylvestris, P. nigra and P. mugo. The effect of plasma treatment on the chemical bonds on the seed surface was studied using the Attenuated Total Reflectance – Fourier Transform Infrared Spectroscopy (ATR-FTIR). Characteristics of seed germination and early growth were measured. ATR – FTIR surface diagnostics did not show any damage. Various statistically significant effects of the three species of seeds treated with DCSBD treatment were recorded. No significant differences were found between control sample and plasma treated ones, but some positive trends were obtained. Positive trends were recorded in germinated and growing seeds of all three species after 3 s exposures above all. Exposure times from 10 s had an inhibitory effect. Based on the results obtained, it can be recommended that forest nurseries performance of nonthermal plasma modification of seeds should be evaluated to measure the durability of the observed growth characteristics.

Klasifikace

  • Druh

    J<sub>imp</sub> - Článek v periodiku v databázi Web of Science

  • CEP obor

  • OECD FORD obor

    10305 - Fluids and plasma physics (including surface physics)

Návaznosti výsledku

  • Projekt

  • Návaznosti

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Ostatní

  • Rok uplatnění

    2020

  • Kód důvěrnosti údajů

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Údaje specifické pro druh výsledku

  • Název periodika

    Plasma Chemistry and Plasma Processing

  • ISSN

    0272-4324

  • e-ISSN

  • Svazek periodika

    41

  • Číslo periodika v rámci svazku

    1

  • Stát vydavatele periodika

    US - Spojené státy americké

  • Počet stran výsledku

    16

  • Strana od-do

    211-226

  • Kód UT WoS článku

    000572705400001

  • EID výsledku v databázi Scopus

    2-s2.0-85091497521