Germination Improvement of Three Pine Species (Pinus) After Diffuse Coplanar Surface Barrier Discharge Plasma Treatment

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60076658%3A12410%2F21%3A43903793" target="_blank" >RIV/60076658:12410/21:43903793 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/60076658:12410/20:43902116

Výsledek na webu

<a href="https://link.springer.com/article/10.1007/s11090-020-10128-5" target="_blank" >https://link.springer.com/article/10.1007/s11090-020-10128-5</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1007/s11090-020-10128-5" target="_blank" >10.1007/s11090-020-10128-5</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Germination Improvement of Three Pine Species (Pinus) After Diffuse Coplanar Surface Barrier Discharge Plasma Treatment

Popis výsledku v původním jazyce

Seed modification by atmospheric pressure non-thermal plasma treatment was tested on pine species. The Diffuse Coplanar Surface Barrier Discharge (DCSBD) with expose times of 0 s, 1 s, 3 s, 5 s, 10 s, 30 s, 60 s was used on seed treatment ofPinus sylvestris,Pinus nigraandPinus mugo. The effect of plasma treatment on the chemical bonds on the seed surface was studied using the Attenuated Total Reflectance-Fourier Transform Infrared Spectroscopy (ATR-FTIR). Characteristics of seed germination and early growth were measured. ATR-FTIR surface diagnostics did not show any damage. Changes in the peak intensities indicated the presence of oxygen and nitrogen-containing groups, or a reduction of the lipid layer on the surface. Various statistically significant effects of the three species of seeds treated with DCSBD treatment were recorded. No significant differences were found between control sample and plasma treated ones, but some positive trends were obtained. Positive trends were recorded in germinated and growing seeds of all three species mainly after 3 s exposures. Exposure times from 10 s had an inhibitory effect. Based on the results obtained, it can be recommended that forest nurseries performance of nonthermal plasma modification of seeds should be evaluated to measure the durability of the observed growth characteristics.

Název v anglickém jazyce

Germination Improvement of Three Pine Species (Pinus) After Diffuse Coplanar Surface Barrier Discharge Plasma Treatment

Popis výsledku anglicky

Seed modification by atmospheric pressure non-thermal plasma treatment was tested on pine species. The Diffuse Coplanar Surface Barrier Discharge (DCSBD) with expose times of 0 s, 1 s, 3 s, 5 s, 10 s, 30 s, 60 s was used on seed treatment ofPinus sylvestris,Pinus nigraandPinus mugo. The effect of plasma treatment on the chemical bonds on the seed surface was studied using the Attenuated Total Reflectance-Fourier Transform Infrared Spectroscopy (ATR-FTIR). Characteristics of seed germination and early growth were measured. ATR-FTIR surface diagnostics did not show any damage. Changes in the peak intensities indicated the presence of oxygen and nitrogen-containing groups, or a reduction of the lipid layer on the surface. Various statistically significant effects of the three species of seeds treated with DCSBD treatment were recorded. No significant differences were found between control sample and plasma treated ones, but some positive trends were obtained. Positive trends were recorded in germinated and growing seeds of all three species mainly after 3 s exposures. Exposure times from 10 s had an inhibitory effect. Based on the results obtained, it can be recommended that forest nurseries performance of nonthermal plasma modification of seeds should be evaluated to measure the durability of the observed growth characteristics.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

21101 - Food and beverages

Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Plasma Chemistry and Plasma Processing

ISSN

0272-4324

e-ISSN

—

Svazek periodika

41

Číslo periodika v rámci svazku

1

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

16

Strana od-do

211-226

Kód UT WoS článku

000572705400001

EID výsledku v databázi Scopus

2-s2.0-85091497521