Sulfamethoxazole removal enhancement from water in high-silica ZSM-5/ozonation synchronous system with low ozone consumption

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60460709%3A41330%2F20%3A81716" target="_blank" >RIV/60460709:41330/20:81716 - isvavai.cz</a>

Výsledek na webu

<a href="https://www.sciencedirect.com/science/article/pii/S2214714419316691?via%3Dihub" target="_blank" >https://www.sciencedirect.com/science/article/pii/S2214714419316691?via%3Dihub</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.jwpe.2019.101083" target="_blank" >10.1016/j.jwpe.2019.101083</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Sulfamethoxazole removal enhancement from water in high-silica ZSM-5/ozonation synchronous system with low ozone consumption

Popis výsledku v původním jazyce

An ozonation process combined with hydrophobic adsorbent high silica ZSM-5 (HSZSM-5) was designed to enhance sulfamethoxazole (SMX) removal and reduce the ozone consumption. The promoted effect of HSZSM-5 on SMX removal was investigated in terms of SMX removal and TOC removal efficiency as well as the ozone consumption. The impacts of pH and CO32-/HCO3- were also analyzed. The presence of HSZSM-5 helped to increase the SMX degradation and TOC removal efficiency and their kinetics rate constants. HSZSM-5 adsorption behaviors for SMX and its degradation intermediates were responsible for the findings. Direct ozone oxidation was the main mechanism of SMX removal as HZSM-5 could not contribute to producing H2O2 and (OH)-O-center dot. Much higher CO32-/HCO3- concentration (over 10 mM) and pH value (over 7) were in favor of SMX degradation. HSZSM-5 had a positive contribution to SMX removal. The mass ratio of ozone consumption to the removed SMX reduced to 0,63 g O-3/g SMX. This system of introducing high

Název v anglickém jazyce

Sulfamethoxazole removal enhancement from water in high-silica ZSM-5/ozonation synchronous system with low ozone consumption

Popis výsledku anglicky

An ozonation process combined with hydrophobic adsorbent high silica ZSM-5 (HSZSM-5) was designed to enhance sulfamethoxazole (SMX) removal and reduce the ozone consumption. The promoted effect of HSZSM-5 on SMX removal was investigated in terms of SMX removal and TOC removal efficiency as well as the ozone consumption. The impacts of pH and CO32-/HCO3- were also analyzed. The presence of HSZSM-5 helped to increase the SMX degradation and TOC removal efficiency and their kinetics rate constants. HSZSM-5 adsorption behaviors for SMX and its degradation intermediates were responsible for the findings. Direct ozone oxidation was the main mechanism of SMX removal as HZSM-5 could not contribute to producing H2O2 and (OH)-O-center dot. Much higher CO32-/HCO3- concentration (over 10 mM) and pH value (over 7) were in favor of SMX degradation. HSZSM-5 had a positive contribution to SMX removal. The mass ratio of ozone consumption to the removed SMX reduced to 0,63 g O-3/g SMX. This system of introducing high

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10511 - Environmental sciences (social aspects to be 5.7)

Projekt

—

Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2020

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

JOURNAL OF WATER PROCESS ENGINEERING

ISSN

2214-7144

e-ISSN

2214-7144

Svazek periodika

33

Číslo periodika v rámci svazku

101083

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

6

Strana od-do

1-6

Kód UT WoS článku

000517599700085

EID výsledku v databázi Scopus

2-s2.0-85076154139