Structural, mechanical and oxidation characteristics of siliconized Ti-Al-X (X = Nb, Ta) alloys

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F14%3A43898093" target="_blank" >RIV/60461373:22310/14:43898093 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.apsusc.2014.04.076" target="_blank" >http://dx.doi.org/10.1016/j.apsusc.2014.04.076</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apsusc.2014.04.076" target="_blank" >10.1016/j.apsusc.2014.04.076</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Structural, mechanical and oxidation characteristics of siliconized Ti-Al-X (X = Nb, Ta) alloys

Popis výsledku v původním jazyce

In this work, Ti-46.6A1, Ti-45.2A1-7.2Nb and Ti-44.8A1-6.6Ta alloys were siliconized by being buried in Si powder followed by heating (900, 1000 and 1100 C for 2-12 h). Observation of the silicide formation kinetics showed that at 900 C, the layers growlinearly with time. Meanwhile, at 1000 and 1100 C, the growth is suppressed after the first two hours of siliconizing. Structure and composition observations revealed that, regardless of the composition of the substrate, the silicide layers formed at 900and 1000 C are composed of sublayers of TiSi2 and TiSi, elongated-shape TiSi crystals and a titanium-depleted sublayer at the silicide/metal interface. The layer formed at 1100 C is Ti5Si3 with an external layer of Al203. The obtained silicide layers possessed very high hardness and improved oxidation resistance. This effect was significantly more pronounced in the case of the ternary alloys. (C) 2014 Elsevier B.V. All rights reserved.

Název v anglickém jazyce

Structural, mechanical and oxidation characteristics of siliconized Ti-Al-X (X = Nb, Ta) alloys

Popis výsledku anglicky

In this work, Ti-46.6A1, Ti-45.2A1-7.2Nb and Ti-44.8A1-6.6Ta alloys were siliconized by being buried in Si powder followed by heating (900, 1000 and 1100 C for 2-12 h). Observation of the silicide formation kinetics showed that at 900 C, the layers growlinearly with time. Meanwhile, at 1000 and 1100 C, the growth is suppressed after the first two hours of siliconizing. Structure and composition observations revealed that, regardless of the composition of the substrate, the silicide layers formed at 900and 1000 C are composed of sublayers of TiSi2 and TiSi, elongated-shape TiSi crystals and a titanium-depleted sublayer at the silicide/metal interface. The layer formed at 1100 C is Ti5Si3 with an external layer of Al203. The obtained silicide layers possessed very high hardness and improved oxidation resistance. This effect was significantly more pronounced in the case of the ternary alloys. (C) 2014 Elsevier B.V. All rights reserved.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

JG - Hutnictví, kovové materiály

OECD FORD obor

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Projekt

<a href="/cs/project/GBP108%2F12%2FG043" target="_blank" >GBP108/12/G043: Mikro- a nanokrystalické materiály s vysokým podílem rozhraní pro moderní strukturní aplikace, biodegradabilní implantáty a uchovávání vodíku</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Surface Science

ISSN

0169-4332

e-ISSN

—

Svazek periodika

307

Číslo periodika v rámci svazku

červen

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

10

Strana od-do

579-588

Kód UT WoS článku

000336596700080

EID výsledku v databázi Scopus

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