High-temperature oxidation of silicide-aluminide layer on the TiAl6V4 alloy prepared by liquid-phase siliconizing

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389021%3A_____%2F16%3A00460175" target="_blank" >RIV/61389021:_____/16:00460175 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.17222/mit.2015.002" target="_blank" >http://dx.doi.org/10.17222/mit.2015.002</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.17222/mit.2015.002" target="_blank" >10.17222/mit.2015.002</a>

Jazyk výsledku

angličtina

Název v původním jazyce

High-temperature oxidation of silicide-aluminide layer on the TiAl6V4 alloy prepared by liquid-phase siliconizing

Popis výsledku v původním jazyce

The method of coating with silicon from the liquid phase (also called the hot-dip method) was presented by several authors who indicated that this was an effective and inexpensive technique capable of producing Ti-Al-Si layers on titanium. and titanium-alloy substrates that are rich in ternary phases. The present study examines the effects of the preparation conditions on the structure and properties of the layers. These layers provide excellent protection from high-temperature oxidation, even at a temperature of 950 degrees C. It was proved with SEM and X-ray analyses that the original tau(2) ternary phase almost completely decomposed into pure Ti5Si4 and TiSi silicides at the temperature of 950 degrees C. The formed layer, consisting of silicide sub-layers, exhibited superior protective properties in high-temperature applications.

Název v anglickém jazyce

High-temperature oxidation of silicide-aluminide layer on the TiAl6V4 alloy prepared by liquid-phase siliconizing

Popis výsledku anglicky

The method of coating with silicon from the liquid phase (also called the hot-dip method) was presented by several authors who indicated that this was an effective and inexpensive technique capable of producing Ti-Al-Si layers on titanium. and titanium-alloy substrates that are rich in ternary phases. The present study examines the effects of the preparation conditions on the structure and properties of the layers. These layers provide excellent protection from high-temperature oxidation, even at a temperature of 950 degrees C. It was proved with SEM and X-ray analyses that the original tau(2) ternary phase almost completely decomposed into pure Ti5Si4 and TiSi silicides at the temperature of 950 degrees C. The formed layer, consisting of silicide sub-layers, exhibited superior protective properties in high-temperature applications.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

JG - Hutnictví, kovové materiály

OECD FORD obor

—

Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2016

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Materials and Technology

ISSN

1580-2949

e-ISSN

—

Svazek periodika

50

Číslo periodika v rámci svazku

2

Stát vydavatele periodika

SI - Slovinská republika

Počet stran výsledku

5

Strana od-do

257-261

Kód UT WoS článku

000375628600015

EID výsledku v databázi Scopus

2-s2.0-84981351701