Annealing of Cu nanolayers on glass: Structural, mechanical and thermodynamic analysis

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F23%3A43926210" target="_blank" >RIV/60461373:22310/23:43926210 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/60461373:22320/23:43926210 RIV/68407700:21340/23:00367115

Výsledek na webu

<a href="https://doi.org/10.1016/j.vacuum.2023.111991" target="_blank" >https://doi.org/10.1016/j.vacuum.2023.111991</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.vacuum.2023.111991" target="_blank" >10.1016/j.vacuum.2023.111991</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Annealing of Cu nanolayers on glass: Structural, mechanical and thermodynamic analysis

Popis výsledku v původním jazyce

Thin Cu nanolayers were deposited on glass substrates by magnetron sputtering. Consequent post-deposition annealing at 300 °C under atmospheric conditions served to form stable oxide layers. X-ray Photoelectron Spectroscopy (XPS) demonstrated that as-sputtered Cu layers on glass were composed of Cu0, Cu1+ and Cu2+ oxidation states and had fcc structure according to X-ray diffraction (XRD). As-sputtered Cu layers on glass further showed a crack-like structure with islands on Scanning electron (SEM) and Atomic force microscope (AFM) images and similar properties to bulk Cu such as low sheet electrical resistance (102 Ω) and a typical surface plasmon resonance band in UV–Vis spectra (650 nm). Owing to annealing, Cu layers on glass demonstrated dramatic changes and a loss of bulk Cu behaviour. XPS and XRD analysis confirmed that annealing caused the formation of CuO, which had a monoclinic structure. Both the annealed and as-sputtered Cu layers on glass acquired more hydrophobic character with aging time (from 65° to 103°). Nanoindentation measurements revealed that annealing produces softer layers with pronounced loss of adhesion and a higher cohesive strength. Thermodynamic calculations confirmed our experimental data. Cu layers on glass have a huge potential in photovoltaics, catalysis and antibacterial surfaces. © 2023 Elsevier Ltd

Název v anglickém jazyce

Annealing of Cu nanolayers on glass: Structural, mechanical and thermodynamic analysis

Popis výsledku anglicky

Thin Cu nanolayers were deposited on glass substrates by magnetron sputtering. Consequent post-deposition annealing at 300 °C under atmospheric conditions served to form stable oxide layers. X-ray Photoelectron Spectroscopy (XPS) demonstrated that as-sputtered Cu layers on glass were composed of Cu0, Cu1+ and Cu2+ oxidation states and had fcc structure according to X-ray diffraction (XRD). As-sputtered Cu layers on glass further showed a crack-like structure with islands on Scanning electron (SEM) and Atomic force microscope (AFM) images and similar properties to bulk Cu such as low sheet electrical resistance (102 Ω) and a typical surface plasmon resonance band in UV–Vis spectra (650 nm). Owing to annealing, Cu layers on glass demonstrated dramatic changes and a loss of bulk Cu behaviour. XPS and XRD analysis confirmed that annealing caused the formation of CuO, which had a monoclinic structure. Both the annealed and as-sputtered Cu layers on glass acquired more hydrophobic character with aging time (from 65° to 103°). Nanoindentation measurements revealed that annealing produces softer layers with pronounced loss of adhesion and a higher cohesive strength. Thermodynamic calculations confirmed our experimental data. Cu layers on glass have a huge potential in photovoltaics, catalysis and antibacterial surfaces. © 2023 Elsevier Ltd

Druh

J_SC - Článek v periodiku v databázi SCOPUS

CEP obor

—

OECD FORD obor

20501 - Materials engineering

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2023

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

VACUUM

ISSN

0042-207X

e-ISSN

—

Svazek periodika

212

Číslo periodika v rámci svazku

June 2023

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

13

Strana od-do

"111991/1"-13

Kód UT WoS článku

—

EID výsledku v databázi Scopus

2-s2.0-85150467818