Chemiresistors based on li-doped cuo–tio2 films
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22340%2F21%3A43922954" target="_blank" >RIV/60461373:22340/21:43922954 - isvavai.cz</a>
Nalezeny alternativní kódy
RIV/67985882:_____/21:00546331 RIV/61389005:_____/21:00546331
Výsledek na webu
<a href="https://www.mdpi.com/2227-9040/9/9/246" target="_blank" >https://www.mdpi.com/2227-9040/9/9/246</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.3390/chemosensors9090246" target="_blank" >10.3390/chemosensors9090246</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Chemiresistors based on li-doped cuo–tio2 films
Popis výsledku v původním jazyce
Chemiresistors based on thin films of the Li-doped CuO–TiO2 heterojunctions were synthesized by a 2-step method: (i) repeated ion beam sputtering of the building elements (on the Si substrates and multisensor platforms); and (ii) thermal annealing in flowing air. The structure and composition of the films were analyzed by several methods: Rutherford Backscattering (RBS), Neutron Depth Profiling (NDP), Secondary Ion Mass Spectrometry (SIMS), and Atomic Force Microscopy (AFM), and their sensitivity to gaseous analytes was evaluated using a specific lab-made device operating in a continuous gas flow mode. The obtained results showed that the Li doping significantly increased the sensitivity of the sensors to oxidizing gases, such as NO2, O3, and Cl2, but not to reducing H2 . The sensing response of the CuO–TiO2–Li chemiresistors improved with increasing Li content. For the best sensors with about 15% Li atoms, the detection limits were as follows: NO2 → 0.5 ppm, O3 → 10 ppb, and Cl2 → 0.1 ppm. The Li-doped sensors showed excellent sensing performance at a lower operating temperature (200◦C); however, even though their response time was only a few minutes, their recovery was slow (up to a few hours) and incomplete. © 2021 by the authors. Licensee MDPI, Basel, Switzerland.
Název v anglickém jazyce
Chemiresistors based on li-doped cuo–tio2 films
Popis výsledku anglicky
Chemiresistors based on thin films of the Li-doped CuO–TiO2 heterojunctions were synthesized by a 2-step method: (i) repeated ion beam sputtering of the building elements (on the Si substrates and multisensor platforms); and (ii) thermal annealing in flowing air. The structure and composition of the films were analyzed by several methods: Rutherford Backscattering (RBS), Neutron Depth Profiling (NDP), Secondary Ion Mass Spectrometry (SIMS), and Atomic Force Microscopy (AFM), and their sensitivity to gaseous analytes was evaluated using a specific lab-made device operating in a continuous gas flow mode. The obtained results showed that the Li doping significantly increased the sensitivity of the sensors to oxidizing gases, such as NO2, O3, and Cl2, but not to reducing H2 . The sensing response of the CuO–TiO2–Li chemiresistors improved with increasing Li content. For the best sensors with about 15% Li atoms, the detection limits were as follows: NO2 → 0.5 ppm, O3 → 10 ppb, and Cl2 → 0.1 ppm. The Li-doped sensors showed excellent sensing performance at a lower operating temperature (200◦C); however, even though their response time was only a few minutes, their recovery was slow (up to a few hours) and incomplete. © 2021 by the authors. Licensee MDPI, Basel, Switzerland.
Klasifikace
Druh
J<sub>imp</sub> - Článek v periodiku v databázi Web of Science
CEP obor
—
OECD FORD obor
21001 - Nano-materials (production and properties)
Návaznosti výsledku
Projekt
<a href="/cs/project/GA19-02804S" target="_blank" >GA19-02804S: Nanostrukturované heteropřechody pro chemirezistory</a><br>
Návaznosti
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Ostatní
Rok uplatnění
2021
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
Chemosensors
ISSN
2227-9040
e-ISSN
—
Svazek periodika
9
Číslo periodika v rámci svazku
9
Stát vydavatele periodika
CH - Švýcarská konfederace
Počet stran výsledku
20
Strana od-do
—
Kód UT WoS článku
000699256200001
EID výsledku v databázi Scopus
2-s2.0-85114992369