Optimalizace silylační procedury pro tenké mesoporézní filmy SiO2 s kationickými trimethylaminopropylamoniovými skupinami

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F07%3A00088024" target="_blank" >RIV/61388955:_____/07:00088024 - isvavai.cz</a>

Výsledek na webu

—

DOI - Digital Object Identifier

—

Jazyk výsledku

angličtina

Název v původním jazyce

Optimization of the silylation procedure of thin mesoporous SiO2 films with cationic trimethylaminopropylammonium groups

Popis výsledku v původním jazyce

Mesoporous silicas are excellent hosts for incorporation of various guest molecules. The properties of the relatively inert silica surface can be drastically changes by the covalent grafting of functional groups, such as thiol-, amino- or alkylammonium ones, by silylation with chloro- or alkoxysilanes. While the silylation procedure has been optimized for powdered mesoporous silica materials with differing porosity, it has not been developed for mesoporous silica thin films yet, even if the obvious differences in diffusion properties and pore accessibility of powders and films would imply the different conditions needed for their silylation. Recently we have faced a serious problem of poor reproducibility of silylation procedure of silica films when investigating their applicability as a matrix for anchoring electrochemically active species and dye molecules. Therefore, the optimization of their silylation procedure has been aimed at in this communication.

Název v anglickém jazyce

Optimization of the silylation procedure of thin mesoporous SiO2 films with cationic trimethylaminopropylammonium groups

Popis výsledku anglicky

Mesoporous silicas are excellent hosts for incorporation of various guest molecules. The properties of the relatively inert silica surface can be drastically changes by the covalent grafting of functional groups, such as thiol-, amino- or alkylammonium ones, by silylation with chloro- or alkoxysilanes. While the silylation procedure has been optimized for powdered mesoporous silica materials with differing porosity, it has not been developed for mesoporous silica thin films yet, even if the obvious differences in diffusion properties and pore accessibility of powders and films would imply the different conditions needed for their silylation. Recently we have faced a serious problem of poor reproducibility of silylation procedure of silica films when investigating their applicability as a matrix for anchoring electrochemically active species and dye molecules. Therefore, the optimization of their silylation procedure has been aimed at in this communication.

Druh

C - Kapitola v odborné knize

CEP obor

CF - Fyzikální chemie a teoretická chemie

OECD FORD obor

—

Projekt

<a href="/cs/project/1M0577" target="_blank" >1M0577: Výzkumné centrum pro nanopovrchové inženýrství</a><br>

Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)<br>R - Projekt Ramcoveho programu EK

Rok uplatnění

2007

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název knihy nebo sborníku

Recent progress in mesostructured materials

ISBN

978-0-444-53084-4

Počet stran výsledku

5

Strana od-do

573-577

Počet stran knihy

—

Název nakladatele

Elsevier B.V./Ltd

Místo vydání

Amsterdam

Kód UT WoS kapitoly

—