Electrochemical Characterization of TiO2 Blocking Layers for Dye-Sensitized Solar Cells

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F14%3A00430103" target="_blank" >RIV/61388955:_____/14:00430103 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1021/jp4103614" target="_blank" >http://dx.doi.org/10.1021/jp4103614</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1021/jp4103614" target="_blank" >10.1021/jp4103614</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Electrochemical Characterization of TiO2 Blocking Layers for Dye-Sensitized Solar Cells

Popis výsledku v původním jazyce

Thin compact layers of TiO2 are grown by thermal oxidation of Ti, by spray pyrolysis, by electrochemical deposition, and by atomic layer deposition. These layers are used in dye-sensitized solar cells to prevent recombination of electrons from the substrate (FTO or Ti) with the hole-conducting medium at this interface. The quality of blocking is evaluated electrochemically by methylviologen, ferro/ferricyanide, and spiro-OMeTAD as the model redox probes. Two types of pinholes in the blocking layers areclassified, and their effective area is quantified. Frequency-independent Mott?Schottky plots are fitted from electrochemical impedance spectroscopy. Certain films of the thicknesses of several nanometers allow distinguishing the depletion layer formation both in the TiO2 film and in the FTO substrate underneath the titania film. The excellent blocking function of thermally oxidized Ti, electrodeposited film (60 nm), and atomic-layer-deposited films (>6 nm) is documented by the relative

Název v anglickém jazyce

Electrochemical Characterization of TiO2 Blocking Layers for Dye-Sensitized Solar Cells

Popis výsledku anglicky

Thin compact layers of TiO2 are grown by thermal oxidation of Ti, by spray pyrolysis, by electrochemical deposition, and by atomic layer deposition. These layers are used in dye-sensitized solar cells to prevent recombination of electrons from the substrate (FTO or Ti) with the hole-conducting medium at this interface. The quality of blocking is evaluated electrochemically by methylviologen, ferro/ferricyanide, and spiro-OMeTAD as the model redox probes. Two types of pinholes in the blocking layers areclassified, and their effective area is quantified. Frequency-independent Mott?Schottky plots are fitted from electrochemical impedance spectroscopy. Certain films of the thicknesses of several nanometers allow distinguishing the depletion layer formation both in the TiO2 film and in the FTO substrate underneath the titania film. The excellent blocking function of thermally oxidized Ti, electrodeposited film (60 nm), and atomic-layer-deposited films (>6 nm) is documented by the relative

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

CG - Elektrochemie

OECD FORD obor

—

Projekt

<a href="/cs/project/GA13-07724S" target="_blank" >GA13-07724S: Materiálové inženýrství pro inovativní Graetzelovy solární články</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Physical Chemistry C

ISSN

1932-7447

e-ISSN

—

Svazek periodika

118

Číslo periodika v rámci svazku

30

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

11

Strana od-do

16408-16718

Kód UT WoS článku

000339930900014

EID výsledku v databázi Scopus

—