Very thin thermally stable TiO2 blocking layers with enhanced electron transfer for solar cells

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F17%3A00476038" target="_blank" >RIV/61388955:_____/17:00476038 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68378271:_____/17:00476038 RIV/61989592:15310/17:73583143

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.apmt.2017.05.008" target="_blank" >http://dx.doi.org/10.1016/j.apmt.2017.05.008</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apmt.2017.05.008" target="_blank" >10.1016/j.apmt.2017.05.008</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Very thin thermally stable TiO2 blocking layers with enhanced electron transfer for solar cells

Popis výsledku v původním jazyce

Very thin TiO2 blocking layers (BLs) are important components for achieving high solar power conversion efficiencies (PCEs) in the dye-sensitized solar cells, and particularly perovskite solar cells (PSCs). When reasonably thin, TiO2 BLs prevent recombination of photogenerated charges at the conductive fluorine-doped tin oxide (FTO) glass substrate used in these devices. However, all previous attempts to generate efficient TiO2 BLs have been hampered by an insufficient charge transfer rate at quasi-amorphous TiO2 and very low thermal stability, leading to the loss of blocking properties after thermal calcination. In this work, we report the deposition of homogenous very thin (~ 30 nm) TiO2 BLs by combining advanced high impulse power magnetron sputtering (HiPIMS) and additional bipolar medium-frequency (MF) magnetron co-sputtering. The as-deposited TiO2 films were shown to provide excellent blocking properties which were preserved even after thermal treatment at 450 °C. Moreover, TiO2 BLs thermally treated at 450 °C show a well-developed rutile structure and 70 times higher photocurrents compared to the as-deposited layers. This work opens possibilities for the utilization of very thin TiO2 layers in solar cell technologies providing a double mode of action: blocking functionality and efficient electron transport.

Název v anglickém jazyce

Very thin thermally stable TiO2 blocking layers with enhanced electron transfer for solar cells

Popis výsledku anglicky

Very thin TiO2 blocking layers (BLs) are important components for achieving high solar power conversion efficiencies (PCEs) in the dye-sensitized solar cells, and particularly perovskite solar cells (PSCs). When reasonably thin, TiO2 BLs prevent recombination of photogenerated charges at the conductive fluorine-doped tin oxide (FTO) glass substrate used in these devices. However, all previous attempts to generate efficient TiO2 BLs have been hampered by an insufficient charge transfer rate at quasi-amorphous TiO2 and very low thermal stability, leading to the loss of blocking properties after thermal calcination. In this work, we report the deposition of homogenous very thin (~ 30 nm) TiO2 BLs by combining advanced high impulse power magnetron sputtering (HiPIMS) and additional bipolar medium-frequency (MF) magnetron co-sputtering. The as-deposited TiO2 films were shown to provide excellent blocking properties which were preserved even after thermal treatment at 450 °C. Moreover, TiO2 BLs thermally treated at 450 °C show a well-developed rutile structure and 70 times higher photocurrents compared to the as-deposited layers. This work opens possibilities for the utilization of very thin TiO2 layers in solar cell technologies providing a double mode of action: blocking functionality and efficient electron transport.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10405 - Electrochemistry (dry cells, batteries, fuel cells, corrosion metals, electrolysis)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2017

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Materials Today

ISSN

2352-9407

e-ISSN

—

Svazek periodika

9

Číslo periodika v rámci svazku

DEC 2017

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

8

Strana od-do

122-129

Kód UT WoS článku

000417805400014

EID výsledku v databázi Scopus

2-s2.0-85021406904