Electrical Contact Resistance of Large-Area Graphene on Pre-Patterned Cu and Au Electrodes

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F22%3A00565440" target="_blank" >RIV/61388955:_____/22:00565440 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/49777513:23220/22:43966912

Výsledek na webu

<a href="https://hdl.handle.net/11104/0336959" target="_blank" >https://hdl.handle.net/11104/0336959</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.3390/nano12244444" target="_blank" >10.3390/nano12244444</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Electrical Contact Resistance of Large-Area Graphene on Pre-Patterned Cu and Au Electrodes

Popis výsledku v původním jazyce

Contact resistance between electrically connected parts of electronic elements can negatively affect their resulting properties and parameters. The contact resistance is influenced by the physicochemical properties of the connected elements and, in most cases, the lowest possible value is required. The issue of contact resistance is also addressed in connection with the increasingly frequently used carbon allotropes. This work aimed to determine the factors that influence contact resistance between graphene prepared by chemical vapour deposition and pre-patterned Cu and Au electrodes onto which graphene is subsequently transferred. It was found that electrode surface treatment methods affect the resistance between Cu and graphene, where contact resistance varied greatly, with an average of 1.25 ± 1.54 kΩ, whereas for the Au electrodes, the deposition techniques did not influence the resulting contact resistance, which decreased by almost two orders of magnitude compared with the Cu electrodes, to 0.03 ± 0.01 kΩ.n

Název v anglickém jazyce

Electrical Contact Resistance of Large-Area Graphene on Pre-Patterned Cu and Au Electrodes

Popis výsledku anglicky

Contact resistance between electrically connected parts of electronic elements can negatively affect their resulting properties and parameters. The contact resistance is influenced by the physicochemical properties of the connected elements and, in most cases, the lowest possible value is required. The issue of contact resistance is also addressed in connection with the increasingly frequently used carbon allotropes. This work aimed to determine the factors that influence contact resistance between graphene prepared by chemical vapour deposition and pre-patterned Cu and Au electrodes onto which graphene is subsequently transferred. It was found that electrode surface treatment methods affect the resistance between Cu and graphene, where contact resistance varied greatly, with an average of 1.25 ± 1.54 kΩ, whereas for the Au electrodes, the deposition techniques did not influence the resulting contact resistance, which decreased by almost two orders of magnitude compared with the Cu electrodes, to 0.03 ± 0.01 kΩ.n

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10403 - Physical chemistry

Projekt

<a href="/cs/project/EF16_026%2F0008382" target="_blank" >EF16_026/0008382: Uhlíkové alotropy s racionalizovanými nanorozhraními a nanospoji pro environmentální a biomedicínské aplikace</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2022

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Nanomaterials

ISSN

2079-4991

e-ISSN

2079-4991

Svazek periodika

12

Číslo periodika v rámci svazku

24

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

14

Strana od-do

4444

Kód UT WoS článku

000904188900001

EID výsledku v databázi Scopus

2-s2.0-85144840050