Coupled chemical reactions in dynamic nanometric confinement: IV. Ion transmission spectrometric analysis of nanofluidic behavior and membrane formation during track etching in polymers

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F15%3A00448875" target="_blank" >RIV/61389005:_____/15:00448875 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1080/10420150.2014.984298" target="_blank" >http://dx.doi.org/10.1080/10420150.2014.984298</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1080/10420150.2014.984298" target="_blank" >10.1080/10420150.2014.984298</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Coupled chemical reactions in dynamic nanometric confinement: IV. Ion transmission spectrometric analysis of nanofluidic behavior and membrane formation during track etching in polymers

Popis výsledku v původním jazyce

In recent papers, it was shown that coupled chemical-topological reactions (CCRs) with both NaOH etchant and silver salts, performed in thin swift-heavy ion-irradiated polymers under the application of a test voltage across the polymer foils, eventuallygave rise to characteristic current/voltage features and Bode plots that were tentatively attributed to the formation of Ag2O membranes within the etched tracks. The same was also found when replacing the silver ions by lithium ions, and adding fluorideions to the NaOH etchant, to promote LiF membrane formation. The membrane thickness was determined to be approximate to 0.2-0.4 mu m in the best cases.ITS also revealed that hitherto membrane formation occurs only in approximate to 1% of all tracks, or even less. The reason for this poor abundance seems to be that the decisive factor for membrane formation, which is the firm anchoring of the emerging solid Ag2O or LiF reaction products on the etched track walls, was hitherto rarely fulfi

Název v anglickém jazyce

Coupled chemical reactions in dynamic nanometric confinement: IV. Ion transmission spectrometric analysis of nanofluidic behavior and membrane formation during track etching in polymers

Popis výsledku anglicky

In recent papers, it was shown that coupled chemical-topological reactions (CCRs) with both NaOH etchant and silver salts, performed in thin swift-heavy ion-irradiated polymers under the application of a test voltage across the polymer foils, eventuallygave rise to characteristic current/voltage features and Bode plots that were tentatively attributed to the formation of Ag2O membranes within the etched tracks. The same was also found when replacing the silver ions by lithium ions, and adding fluorideions to the NaOH etchant, to promote LiF membrane formation. The membrane thickness was determined to be approximate to 0.2-0.4 mu m in the best cases.ITS also revealed that hitherto membrane formation occurs only in approximate to 1% of all tracks, or even less. The reason for this poor abundance seems to be that the decisive factor for membrane formation, which is the firm anchoring of the emerging solid Ag2O or LiF reaction products on the etched track walls, was hitherto rarely fulfi

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BG - Jaderná, atomová a molekulová fyzika, urychlovače

OECD FORD obor

—

Projekt

<a href="/cs/project/GBP108%2F12%2FG108" target="_blank" >GBP108/12/G108: Příprava, modifikace a charakterizace materiálů zářením</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2015

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Radiation Effects and Defects in Solids

ISSN

1042-0150

e-ISSN

—

Svazek periodika

170

Číslo periodika v rámci svazku

3

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

20

Strana od-do

155-174

Kód UT WoS článku

000359488500002

EID výsledku v databázi Scopus

2-s2.0-84938547784