Tuning of electrocatalytic properties of MoS2 by chalcogenide ion implantation
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F19%3A00503136" target="_blank" >RIV/61389005:_____/19:00503136 - isvavai.cz</a>
Nalezeny alternativní kódy
RIV/60461373:22310/19:43918077 RIV/44555601:13440/19:43894604
Výsledek na webu
<a href="https://doi.org/10.1016/j.apmt.2018.12.009" target="_blank" >https://doi.org/10.1016/j.apmt.2018.12.009</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.apmt.2018.12.009" target="_blank" >10.1016/j.apmt.2018.12.009</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Tuning of electrocatalytic properties of MoS2 by chalcogenide ion implantation
Popis výsledku v původním jazyce
MOS2 is one of the most explored and promising material for electrocatalytic water splitting by hydrogen evolution reaction (HER). However, in its bulk form, MoS2 possesses only poor activity towards HER. Therefore, appropriate treatment has to be employed to tune its catalytic properties. In this study, we report the influence of ion bombardment (S, Se and Te ions) with medium ion energy (400 keV) and various ion fluences (1 x 10(14)-1 x 10(16) ions/cm(2)) on the electrocatalytic properties of bulk MoS2 crystals. Our results showed that upon irradiation, sulfur vacancies were created. Upon exposure to ambient atmosphere, sulfur vacancies were partially replaced by oxygen, which led to surface oxidation. Nevertheless, samples irradiated using the higher range of ion fluences have generally showed enhanced catalytic HER performance in comparison with untreated MoS2 crystals. Furthermore, we have also demonstrated that ion irradiation/implantation can serve as a tool for doping of MoS2 crystals with Se and Te which can also influence the HER performance. The reported results demonstrate that ion beam irradiation can be used for doping as well as creation of sulfur vacancies in bulk MoS2 crystals which is fundamental for the HER performance.
Název v anglickém jazyce
Tuning of electrocatalytic properties of MoS2 by chalcogenide ion implantation
Popis výsledku anglicky
MOS2 is one of the most explored and promising material for electrocatalytic water splitting by hydrogen evolution reaction (HER). However, in its bulk form, MoS2 possesses only poor activity towards HER. Therefore, appropriate treatment has to be employed to tune its catalytic properties. In this study, we report the influence of ion bombardment (S, Se and Te ions) with medium ion energy (400 keV) and various ion fluences (1 x 10(14)-1 x 10(16) ions/cm(2)) on the electrocatalytic properties of bulk MoS2 crystals. Our results showed that upon irradiation, sulfur vacancies were created. Upon exposure to ambient atmosphere, sulfur vacancies were partially replaced by oxygen, which led to surface oxidation. Nevertheless, samples irradiated using the higher range of ion fluences have generally showed enhanced catalytic HER performance in comparison with untreated MoS2 crystals. Furthermore, we have also demonstrated that ion irradiation/implantation can serve as a tool for doping of MoS2 crystals with Se and Te which can also influence the HER performance. The reported results demonstrate that ion beam irradiation can be used for doping as well as creation of sulfur vacancies in bulk MoS2 crystals which is fundamental for the HER performance.
Klasifikace
Druh
J<sub>imp</sub> - Článek v periodiku v databázi Web of Science
CEP obor
—
OECD FORD obor
10304 - Nuclear physics
Návaznosti výsledku
Projekt
Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.
Návaznosti
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Ostatní
Rok uplatnění
2019
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
Applied Materials Today
ISSN
2352-9407
e-ISSN
—
Svazek periodika
14
Číslo periodika v rámci svazku
3
Stát vydavatele periodika
NL - Nizozemsko
Počet stran výsledku
8
Strana od-do
216-223
Kód UT WoS článku
000458430900023
EID výsledku v databázi Scopus
2-s2.0-85059145232