Abatement of Tetrafluormethane Using Thermal Steam Plasma

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389021%3A_____%2F19%3A00522226" target="_blank" >RIV/61389021:_____/19:00522226 - isvavai.cz</a>

Výsledek na webu

<a href="https://link.springer.com/article/10.1007%2Fs11090-019-10047-0" target="_blank" >https://link.springer.com/article/10.1007%2Fs11090-019-10047-0</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1007/s11090-019-10047-0" target="_blank" >10.1007/s11090-019-10047-0</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Abatement of Tetrafluormethane Using Thermal Steam Plasma

Popis výsledku v původním jazyce

Perfluorinated compounds (PFCs) increasingly utilized in electronic manufacturing represent a potent source of global warming effect. Because of extremely high stability of PFCs only very high temperature is effective for their destruction. Thermal plasma offers higher destruction and removal efficiency as compared to conventional methods allowing to reach sufficiently high temperature as well as suitable conditions, including high enthalpy and reactive environment for destruction even of the most persistent PFCs. The aim pursued by this work is to apply water and gas stabilized DC-plasma torch for generating steam plasma for efficient abatement of the most persistent PFC, i.e., CF4, and to observe a dependence of destruction and removal efficiency on operational conditions, including concentration of CF4, input arc power of the plasma torch and an influence of an additional gas. The experiments were carried out at 20 kW and 40 kW of torch power in the concentration range 1-20% of CF4 in mixture with both nitrogen and argon and total feed rate 50 L/min in plasma chemical reactor. The mixture with argon exhibit considerably higher destruction efficiency than that with nitrogen. The highest destruction efficiency was attained in the mixture CF4/argon at 40 kW of torch power. Among other gases (CO2, O-2, H-2) added to CF4 the only hydrogen exhibited a positive effect to destruction performance. It was found an optimal feed rate of additional hydrogen corresponding to the maximum of destruction efficiency.

Název v anglickém jazyce

Abatement of Tetrafluormethane Using Thermal Steam Plasma

Popis výsledku anglicky

Perfluorinated compounds (PFCs) increasingly utilized in electronic manufacturing represent a potent source of global warming effect. Because of extremely high stability of PFCs only very high temperature is effective for their destruction. Thermal plasma offers higher destruction and removal efficiency as compared to conventional methods allowing to reach sufficiently high temperature as well as suitable conditions, including high enthalpy and reactive environment for destruction even of the most persistent PFCs. The aim pursued by this work is to apply water and gas stabilized DC-plasma torch for generating steam plasma for efficient abatement of the most persistent PFC, i.e., CF4, and to observe a dependence of destruction and removal efficiency on operational conditions, including concentration of CF4, input arc power of the plasma torch and an influence of an additional gas. The experiments were carried out at 20 kW and 40 kW of torch power in the concentration range 1-20% of CF4 in mixture with both nitrogen and argon and total feed rate 50 L/min in plasma chemical reactor. The mixture with argon exhibit considerably higher destruction efficiency than that with nitrogen. The highest destruction efficiency was attained in the mixture CF4/argon at 40 kW of torch power. Among other gases (CO2, O-2, H-2) added to CF4 the only hydrogen exhibited a positive effect to destruction performance. It was found an optimal feed rate of additional hydrogen corresponding to the maximum of destruction efficiency.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20402 - Chemical process engineering

Projekt

<a href="/cs/project/GC17-10246J" target="_blank" >GC17-10246J: Rozklad perfluorovaných sloučenin a fluorovaných látek ztenčujících ozónovou vrstvu v proudu termického plazmatu</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2019

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Plasma Chemistry and Plasma Processing

ISSN

0272-4324

e-ISSN

—

Svazek periodika

40

Číslo periodika v rámci svazku

1

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

15

Strana od-do

309-323

Kód UT WoS článku

000495301600001

EID výsledku v databázi Scopus

2-s2.0-85074811383