UV Laser Photolysis of Disiloxanes for Chemical Vapour Deposition of Nano-Textured Silicones.

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F67985858%3A_____%2F02%3A27013071" target="_blank" >RIV/67985858:_____/02:27013071 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/67985858:_____/02:27020338

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

UV Laser Photolysis of Disiloxanes for Chemical Vapour Deposition of Nano-Textured Silicones.

Popis výsledku v původním jazyce

Gas-phase photolysis of methyldisiloxanes [(CH3)(n)H3-nSi](2)O (n = 1-3) has been achieved for the first time through absorption of ArF laser radiation at 193 nm and has been shown to yield C-1-C-2 hydrocarbons (major volatile products), methylsilanes (minor volatile products), and solid methylsilicones with their H(Si) content and Si/O ratio reflecting those of the parent compounds. The identified volatile and solid products are compatible with a number of reactions occurring within less than 1 ms in anarrow region of the gaseous sample maintained at room temperature. These reactions are discussed. The solid deposited materials were characterized by FTIR, NMR, UV, and XP spectroscopy, electron microscopy, and thermal gravimetry. They were revealed tocontain all possible SiCxHyOz (x + y + z = 4) compositions, to possess nanometer-sized texture, and to be thermally more stable than linear poly(dialkylsiloxanes).

Název v anglickém jazyce

UV Laser Photolysis of Disiloxanes for Chemical Vapour Deposition of Nano-Textured Silicones.

Popis výsledku anglicky

Gas-phase photolysis of methyldisiloxanes [(CH3)(n)H3-nSi](2)O (n = 1-3) has been achieved for the first time through absorption of ArF laser radiation at 193 nm and has been shown to yield C-1-C-2 hydrocarbons (major volatile products), methylsilanes (minor volatile products), and solid methylsilicones with their H(Si) content and Si/O ratio reflecting those of the parent compounds. The identified volatile and solid products are compatible with a number of reactions occurring within less than 1 ms in anarrow region of the gaseous sample maintained at room temperature. These reactions are discussed. The solid deposited materials were characterized by FTIR, NMR, UV, and XP spectroscopy, electron microscopy, and thermal gravimetry. They were revealed tocontain all possible SiCxHyOz (x + y + z = 4) compositions, to possess nanometer-sized texture, and to be thermally more stable than linear poly(dialkylsiloxanes).

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

CH - Jaderná a kvantová chemie, fotochemie

OECD FORD obor

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Projekt

<a href="/cs/project/IAA4072806" target="_blank" >IAA4072806: Laserově iniciovaný rozklad hydridodisiloxanů</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2002

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Chemistry of Materials

ISSN

0897-4756

e-ISSN

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Svazek periodika

14

Číslo periodika v rámci svazku

1

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

10

Strana od-do

144-153

Kód UT WoS článku

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EID výsledku v databázi Scopus

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