One-step 3D microstructuring of PMMA using MeV light ions

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F67985882%3A_____%2F22%3A00565861" target="_blank" >RIV/67985882:_____/22:00565861 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61389005:_____/22:00565861

Výsledek na webu

<a href="https://doi.org/10.1051/epjconf/202226102001" target="_blank" >https://doi.org/10.1051/epjconf/202226102001</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1051/epjconf/202226102001" target="_blank" >10.1051/epjconf/202226102001</a>

Jazyk výsledku

angličtina

Název v původním jazyce

One-step 3D microstructuring of PMMA using MeV light ions

Popis výsledku v původním jazyce

The conventional procedure for creating 3D microstructures in resists by ion beam lithography consists of two stages – exposure and developing. However, single stage of manufacturing 3D structures in resist is also possible. Irradiation of PMMA can cause it to shrink. This feature of the polymer can be used for one-step three-dimensional microstructuring, which simplifies the manufacturing process. The shrinkage of PMMA film on a substrate has been extensively studied, while research on free-standing film is not comprehensive. The use of free-standing PMMA film allows the creation of a flexible material with 3D microstructures, which can be used in medicine, optics, and electronics. The question here is whether the results obtained for the PMMA film on the substrate are applicable to the freestanding film. Since the nature of shrinking is outgassing of volatile products, the film on the substrate has only one surface for the release of gases, while in the free-standing film, gases can be released from the sample from both sides. Therefore, the shrinking in the free-standing film occurs on both sides. The aim of this work is to study the shrinkage of the free-standing film and compare it with that of the film of the same thickness coated on the substrate.

Název v anglickém jazyce

One-step 3D microstructuring of PMMA using MeV light ions

Popis výsledku anglicky

The conventional procedure for creating 3D microstructures in resists by ion beam lithography consists of two stages – exposure and developing. However, single stage of manufacturing 3D structures in resist is also possible. Irradiation of PMMA can cause it to shrink. This feature of the polymer can be used for one-step three-dimensional microstructuring, which simplifies the manufacturing process. The shrinkage of PMMA film on a substrate has been extensively studied, while research on free-standing film is not comprehensive. The use of free-standing PMMA film allows the creation of a flexible material with 3D microstructures, which can be used in medicine, optics, and electronics. The question here is whether the results obtained for the PMMA film on the substrate are applicable to the freestanding film. Since the nature of shrinking is outgassing of volatile products, the film on the substrate has only one surface for the release of gases, while in the free-standing film, gases can be released from the sample from both sides. Therefore, the shrinking in the free-standing film occurs on both sides. The aim of this work is to study the shrinkage of the free-standing film and compare it with that of the film of the same thickness coated on the substrate.

Druh

D - Stať ve sborníku

CEP obor

—

OECD FORD obor

10306 - Optics (including laser optics and quantum optics)

Projekt

<a href="/cs/project/GA19-02482S" target="_blank" >GA19-02482S: Syntéza pokročilých mikrostruktur v inovativních polymerech a nanokompozitech metodou mikrostrukturování iontovým svazkem</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2022

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

EPJ Web of Conferences

ISBN

—

ISSN

2100-014X

e-ISSN

2100-014X

Počet stran výsledku

6

Strana od-do

02001

Název nakladatele

EDP sciences

Místo vydání

Les ulis

Místo konání akce

Prague

Datum konání akce

12. 9. 2021

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

—