Nanoscale morphology tailoring in plasma deposited CN (x) layers

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F67985882%3A_____%2F23%3A00571728" target="_blank" >RIV/67985882:_____/23:00571728 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1088/1361-6463/accc3f" target="_blank" >http://dx.doi.org/10.1088/1361-6463/accc3f</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6463/accc3f" target="_blank" >10.1088/1361-6463/accc3f</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Nanoscale morphology tailoring in plasma deposited CN (x) layers

Popis výsledku v původním jazyce

Magnetron discharge plasma was applied for the synthesis of CN (x) thin layers using methane and nitrogen gas precursors. The incorporation of nitrogen in the carbon network resulted in the dramatic evolution of growth morphology: from a 'buried' porous layer observed at low nitrogen incorporation to aligned bundles of nanorods grown perpendicular to the substrate surface at maximum discharge power and nitrogen flow. The films deposited at the low discharge power and high nitrogen incorporation exhibited a mesoporous sponge-like morphology after vacuum annealing. Relevant physical mechanisms responsible for the formation of nano- and mesoshaped morphology are discussed in terms of the effects of internal mechanical stresses and plasma etching. In addition, the sensing properties of the sponge-like layer were preliminarily examined in water vapor and ammonia ambients. The CN (x) films showed enhanced sensitivity to ammonia and reverse electrical response to moisture in comparison with a nitrogen-free nanoporous carbon film, which were assigned to modification of the electronic properties of the nitridated surface.

Název v anglickém jazyce

Nanoscale morphology tailoring in plasma deposited CN (x) layers

Popis výsledku anglicky

Magnetron discharge plasma was applied for the synthesis of CN (x) thin layers using methane and nitrogen gas precursors. The incorporation of nitrogen in the carbon network resulted in the dramatic evolution of growth morphology: from a 'buried' porous layer observed at low nitrogen incorporation to aligned bundles of nanorods grown perpendicular to the substrate surface at maximum discharge power and nitrogen flow. The films deposited at the low discharge power and high nitrogen incorporation exhibited a mesoporous sponge-like morphology after vacuum annealing. Relevant physical mechanisms responsible for the formation of nano- and mesoshaped morphology are discussed in terms of the effects of internal mechanical stresses and plasma etching. In addition, the sensing properties of the sponge-like layer were preliminarily examined in water vapor and ammonia ambients. The CN (x) films showed enhanced sensitivity to ammonia and reverse electrical response to moisture in comparison with a nitrogen-free nanoporous carbon film, which were assigned to modification of the electronic properties of the nitridated surface.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20501 - Materials engineering

Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2023

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Physics D-Applied Physics

ISSN

0022-3727

e-ISSN

1361-6463

Svazek periodika

56

Číslo periodika v rámci svazku

27

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

13

Strana od-do

275302

Kód UT WoS článku

000976644400001

EID výsledku v databázi Scopus

2-s2.0-85154567469