Effect of sample tilt on PEEM resolution

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F12%3A00385323" target="_blank" >RIV/68081731:_____/12:00385323 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.ultramic.2011.11.011" target="_blank" >http://dx.doi.org/10.1016/j.ultramic.2011.11.011</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.ultramic.2011.11.011" target="_blank" >10.1016/j.ultramic.2011.11.011</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Effect of sample tilt on PEEM resolution

Popis výsledku v původním jazyce

In electron microscopy design, the systems are usually assumed to be perfectly aligned or that possible small imperfections can be eliminated by simple multipole correctors (centering deflectors, stigmators) without loss of resolution. However, in some cases, like in the cathode lens between the sample and the objective lens in the photoemission electron microscope, even a small imperfection can impair the resolution significantly. Because of the strong field between the sample and the objective lens, even a small tilt of the sample generates a parasitic dipole field, which decreases resolution and causes image deformations. We present a simulation of the influence of a small sample tilt on the system resolution based on modern computational methods that enable simulation of the whole system including the parasitic fields, proper setting of centering deflectors and stigmators. The resolution is determined by simulating the point spread function and finding the size of its significant p

Název v anglickém jazyce

Effect of sample tilt on PEEM resolution

Popis výsledku anglicky

In electron microscopy design, the systems are usually assumed to be perfectly aligned or that possible small imperfections can be eliminated by simple multipole correctors (centering deflectors, stigmators) without loss of resolution. However, in some cases, like in the cathode lens between the sample and the objective lens in the photoemission electron microscope, even a small imperfection can impair the resolution significantly. Because of the strong field between the sample and the objective lens, even a small tilt of the sample generates a parasitic dipole field, which decreases resolution and causes image deformations. We present a simulation of the influence of a small sample tilt on the system resolution based on modern computational methods that enable simulation of the whole system including the parasitic fields, proper setting of centering deflectors and stigmators. The resolution is determined by simulating the point spread function and finding the size of its significant p

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BH - Optika, masery a lasery

OECD FORD obor

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Projekt

<a href="/cs/project/IAA100650805" target="_blank" >IAA100650805: Vady seřízení elektronově optických systémů</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Ultramicroscopy

ISSN

0304-3991

e-ISSN

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Svazek periodika

119

Číslo periodika v rámci svazku

S1

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

6

Strana od-do

45-50

Kód UT WoS článku

000308079200008

EID výsledku v databázi Scopus

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