Influence of annealing to stress in CNx:(H) films observed by SLEEM

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F12%3A00387382" target="_blank" >RIV/68081731:_____/12:00387382 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Influence of annealing to stress in CNx:(H) films observed by SLEEM

Popis výsledku v původním jazyce

The effect of high residual stress on the quality of thin sputtered carbon nitride films has been studied by Scanning Low Energy Electron Microscopy (SLEEM). Basically, two different types of stress can be identified in thin films: compressive stress andtensile stress. Compressive stress leads to wrinkling and film delamination and tensile stress can cause the fracturing of thin films. Experiments were made in the Tescan TS 5130 MM equipped with the Cathode Lens system (CL), which enable us to observesamples at arbitrary landing energies of the illuminating electrons. Operating of a SEM at low energies offers several advantages: an increase of materials contrast via low energy, high ratio SE, BSE signal and noise, smaller interaction volume and elimination of charging effects. The effect of annealing in vacuum to residual stress (calculated from Stoney?s equation) was measured. The porous character of films was observed by thermal desorption spectroscopy (TDS).

Název v anglickém jazyce

Influence of annealing to stress in CNx:(H) films observed by SLEEM

Popis výsledku anglicky

The effect of high residual stress on the quality of thin sputtered carbon nitride films has been studied by Scanning Low Energy Electron Microscopy (SLEEM). Basically, two different types of stress can be identified in thin films: compressive stress andtensile stress. Compressive stress leads to wrinkling and film delamination and tensile stress can cause the fracturing of thin films. Experiments were made in the Tescan TS 5130 MM equipped with the Cathode Lens system (CL), which enable us to observesamples at arbitrary landing energies of the illuminating electrons. Operating of a SEM at low energies offers several advantages: an increase of materials contrast via low energy, high ratio SE, BSE signal and noise, smaller interaction volume and elimination of charging effects. The effect of annealing in vacuum to residual stress (calculated from Stoney?s equation) was measured. The porous character of films was observed by thermal desorption spectroscopy (TDS).

Druh

D - Stať ve sborníku

CEP obor

JA - Elektronika a optoelektronika, elektrotechnika

OECD FORD obor

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Projekt

<a href="/cs/project/ED0017%2F01%2F01" target="_blank" >ED0017/01/01: APLIKACNÍ A VÝVOJOVÉ LABORATORE POKROCILÝCH MIKROTECHNOLOGIÍ A NANOTECHNOLOGIÍ</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

METAL 2012 Conference Proceedings. 21st International Conference on Metallurgy and Materials

ISBN

978-80-87294-29-1

ISSN

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e-ISSN

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Počet stran výsledku

6

Strana od-do

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Název nakladatele

TANGER Ltd

Místo vydání

Ostrava

Místo konání akce

Brno

Datum konání akce

23. 5. 2012

Typ akce podle státní příslušnosti

EUR - Evropská akce

Kód UT WoS článku

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