Low-energy electron microscopy of graphene outside UHV: electron-induced removal of PMMA residues used for graphene transfer
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F20%3A00525529" target="_blank" >RIV/68081731:_____/20:00525529 - isvavai.cz</a>
Nalezeny alternativní kódy
RIV/00216305:26620/20:PU138226
Výsledek na webu
<a href="https://www.sciencedirect.com/science/article/pii/S0368204818302068" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0368204818302068</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.elspec.2019.06.005" target="_blank" >10.1016/j.elspec.2019.06.005</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Low-energy electron microscopy of graphene outside UHV: electron-induced removal of PMMA residues used for graphene transfer
Popis výsledku v původním jazyce
Two-dimensional materials, such as graphene, are usually prepared by chemical vapor deposition (CVD) on selected substrates, and their transfer is completed with a supporting layer, mostly polymethyl methacrylate (PMMA). Indeed, the PMMA has to be removed precisely to obtain the predicted superior properties of graphene after the transfer process. We demonstrate a new and effective technique to achieve a polymer-free CVD graphene by utilizing low-energy electron irradiation in a scanning low-energy electron microscope (SLEEM). The influence of electron-landing energy on cleaning efficiency and graphene quality was observed by SLEEM, Raman spectroscopy (the presence of disorder D peak) and XPS (the deconvolution of the C 1s peak). After removing the absorbed molecules and polymer residues from the graphene surface with slow electrons, the individual graphene layers can also be distinguished outside ultra-high vacuum conditions in both the reflected and transmitted modes of a scanning low-energy (transmission) electron microscope.
Název v anglickém jazyce
Low-energy electron microscopy of graphene outside UHV: electron-induced removal of PMMA residues used for graphene transfer
Popis výsledku anglicky
Two-dimensional materials, such as graphene, are usually prepared by chemical vapor deposition (CVD) on selected substrates, and their transfer is completed with a supporting layer, mostly polymethyl methacrylate (PMMA). Indeed, the PMMA has to be removed precisely to obtain the predicted superior properties of graphene after the transfer process. We demonstrate a new and effective technique to achieve a polymer-free CVD graphene by utilizing low-energy electron irradiation in a scanning low-energy electron microscope (SLEEM). The influence of electron-landing energy on cleaning efficiency and graphene quality was observed by SLEEM, Raman spectroscopy (the presence of disorder D peak) and XPS (the deconvolution of the C 1s peak). After removing the absorbed molecules and polymer residues from the graphene surface with slow electrons, the individual graphene layers can also be distinguished outside ultra-high vacuum conditions in both the reflected and transmitted modes of a scanning low-energy (transmission) electron microscope.
Klasifikace
Druh
J<sub>imp</sub> - Článek v periodiku v databázi Web of Science
CEP obor
—
OECD FORD obor
20201 - Electrical and electronic engineering
Návaznosti výsledku
Projekt
Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.
Návaznosti
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Ostatní
Rok uplatnění
2020
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
Journal of Electron Spectroscopy and Related Phenomena
ISSN
0368-2048
e-ISSN
—
Svazek periodika
241
Číslo periodika v rámci svazku
MAY
Stát vydavatele periodika
NL - Nizozemsko
Počet stran výsledku
7
Strana od-do
146873
Kód UT WoS článku
000540723700016
EID výsledku v databázi Scopus
2-s2.0-85069968563