Characterization and Analysis of Field Electron Emission from Copper Tips

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F24%3A00617495" target="_blank" >RIV/68081731:_____/24:00617495 - isvavai.cz</a>

Výsledek na webu

<a href="https://ieeexplore.ieee.org/document/10652547" target="_blank" >https://ieeexplore.ieee.org/document/10652547</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1109/IVNC63480.2024.10652547" target="_blank" >10.1109/IVNC63480.2024.10652547</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Characterization and Analysis of Field Electron Emission from Copper Tips

Popis výsledku v původním jazyce

In the present investigation, field electron emission (FEE) from high-purity copper emitters has been studied under vacuum conditions of approximately 10(-5) mbar. This research aimed to study the emission properties of copper under low-pressure environments, which is essential for applications in fields such as electron microscopy and vacuum electronics. The current-voltage (I-V) characteristics are analyzed utilizing Murphy-Good (MG) method plots in this study. In addition, a Scanning Electron Microscope with Energy-Dispersive X-ray Spectroscopy (SEM-EDS) was used to visualize the surface of the emitters and analyze sample purity. The spatial distribution of electron emission and current stability were obtained as well to analyze electron emission behavior from the surface of the tips. Electron mapping demonstrated a consistent component distribution throughout the copper tips, showing uniformity in their composition. The current-voltage characteristics showed a notable switching phenomenon that is explained by the existence of a thin oxide layer formed on the emitter's surfaces. This thin oxide layer provides additional quantum barrier for the surface.

Název v anglickém jazyce

Characterization and Analysis of Field Electron Emission from Copper Tips

Popis výsledku anglicky

In the present investigation, field electron emission (FEE) from high-purity copper emitters has been studied under vacuum conditions of approximately 10(-5) mbar. This research aimed to study the emission properties of copper under low-pressure environments, which is essential for applications in fields such as electron microscopy and vacuum electronics. The current-voltage (I-V) characteristics are analyzed utilizing Murphy-Good (MG) method plots in this study. In addition, a Scanning Electron Microscope with Energy-Dispersive X-ray Spectroscopy (SEM-EDS) was used to visualize the surface of the emitters and analyze sample purity. The spatial distribution of electron emission and current stability were obtained as well to analyze electron emission behavior from the surface of the tips. Electron mapping demonstrated a consistent component distribution throughout the copper tips, showing uniformity in their composition. The current-voltage characteristics showed a notable switching phenomenon that is explained by the existence of a thin oxide layer formed on the emitter's surfaces. This thin oxide layer provides additional quantum barrier for the surface.

Druh

D - Stať ve sborníku

CEP obor

—

OECD FORD obor

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2024

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

2024 37th International Vacuum Nanoelectronics Conference, IVNC 2024

ISBN

979-8-3503-7977-8

ISSN

2164-2370

e-ISSN

—

Počet stran výsledku

2

Strana od-do

82-83

Název nakladatele

IEEE

Místo vydání

New York

Místo konání akce

Brno

Datum konání akce

15. 7. 2024

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

001310530600076