PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F12%3A00382104" target="_blank" >RIV/68378271:_____/12:00382104 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68407700:21340/12:00191784 RIV/68407700:21460/12:00191784

Výsledek na webu

<a href="http://dx.doi.org/10.1016/j.apsusc.2012.02.042" target="_blank" >http://dx.doi.org/10.1016/j.apsusc.2012.02.042</a>

DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers

Popis výsledku v původním jazyce

Utilizing pulsed laser deposition technique combined with the radio-frequency discharge (between the target and the substrate), we were able to grow polycrystalline titanium dioxide layers (anatase, rutile) at substrate temperatures 85 °C and 150 °C. Besides the discharge no additional substrate heating was applied. The layers were prepared from pure titanium and titanium dioxide targets. To optimize deposition conditions, the oxygen background pressure, fluence (from 2 J cm2 to 9 J cm2), and dischargepower were varied. Silicon wafers (1 1 1), fused silica, and polyethylene tubes were used as substrates. The layers? crystalline structure was determined by X-ray diffraction. Atomic force microscopy was used to characterize the surface properties.

Název v anglickém jazyce

PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers

Popis výsledku anglicky

Utilizing pulsed laser deposition technique combined with the radio-frequency discharge (between the target and the substrate), we were able to grow polycrystalline titanium dioxide layers (anatase, rutile) at substrate temperatures 85 °C and 150 °C. Besides the discharge no additional substrate heating was applied. The layers were prepared from pure titanium and titanium dioxide targets. To optimize deposition conditions, the oxygen background pressure, fluence (from 2 J cm2 to 9 J cm2), and dischargepower were varied. Silicon wafers (1 1 1), fused silica, and polyethylene tubes were used as substrates. The layers? crystalline structure was determined by X-ray diffraction. Atomic force microscopy was used to characterize the surface properties.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BM - Fyzika pevných látek a magnetismus

OECD FORD obor

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Projekt

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Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Surface Science

ISSN

0169-4332

e-ISSN

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Svazek periodika

258

Číslo periodika v rámci svazku

23

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

4

Strana od-do

9333-9336

Kód UT WoS článku

000307241800047

EID výsledku v databázi Scopus

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