Comparison of the growth of ultrathin silver film by pulsed laser deposition and magnetron sputtering

Kód výsledku v IS VaVaI

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Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

Comparison of the growth of ultrathin silver film by pulsed laser deposition and magnetron sputtering

Popis výsledku v původním jazyce

Silver thin films exhibit unusual properties and performances due to unique electrical and optical properties of silver. The films attract attention in eg. photonics, electronics, sensors and biophysics. Particular application requires the film of special morphology, ie. isolated nanoparticles, arrays, or smooth surface. It is important to choose proper deposition technique and understand mechanism of silver nucleation and growth to better control the film properties. Hence, we investigate and compare the growth of ultrathin silver film by pulsed laser deposition (PLD) and magnetron sputtering techniques. A silver target was ablated by a Nd:YAG laser operating at wavelength of 266 nm and pulse length of 4 ns in case of PLD. Silver RF magnetron sputtering was performed at power varied from 30 to 100 W. Both experiments were carried out in argon atmosphere of pressure varied from 0.5 to 3 Pa. We focus on in-situ monitoring of electrical and optical properties of the growing layer.

Název v anglickém jazyce

Comparison of the growth of ultrathin silver film by pulsed laser deposition and magnetron sputtering

Popis výsledku anglicky

Silver thin films exhibit unusual properties and performances due to unique electrical and optical properties of silver. The films attract attention in eg. photonics, electronics, sensors and biophysics. Particular application requires the film of special morphology, ie. isolated nanoparticles, arrays, or smooth surface. It is important to choose proper deposition technique and understand mechanism of silver nucleation and growth to better control the film properties. Hence, we investigate and compare the growth of ultrathin silver film by pulsed laser deposition (PLD) and magnetron sputtering techniques. A silver target was ablated by a Nd:YAG laser operating at wavelength of 266 nm and pulse length of 4 ns in case of PLD. Silver RF magnetron sputtering was performed at power varied from 30 to 100 W. Both experiments were carried out in argon atmosphere of pressure varied from 0.5 to 3 Pa. We focus on in-situ monitoring of electrical and optical properties of the growing layer.

Druh

O - Ostatní výsledky

CEP obor

BH - Optika, masery a lasery

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů