Plasmonic titanium nitride nanomaterials prepared by physical vapor deposition methods

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989592%3A15640%2F23%3A73623208" target="_blank" >RIV/61989592:15640/23:73623208 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61989592:15310/23:73623208 RIV/61989100:27640/23:10253961

Výsledek na webu

<a href="https://iopscience.iop.org/article/10.1088/1361-6528/acfc4f" target="_blank" >https://iopscience.iop.org/article/10.1088/1361-6528/acfc4f</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1361-6528/acfc4f" target="_blank" >10.1088/1361-6528/acfc4f</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Plasmonic titanium nitride nanomaterials prepared by physical vapor deposition methods

Popis výsledku v původním jazyce

Titanium nitride (TiN) has recently emerged as an alternative to coinage metals to enable the development of integrated plasmonic devices at visible and medium-infrared wavelengths. In this regard, its optical performance can be conveniently tuned by tailoring the process parameters of physical vapor deposition methods, such as magnetron sputtering and pulsed laser deposition (PLD). This review first introduces the fundamental features of TiN and a description on its optical properties, including insights on the main experimental techniques to measure them. Afterwards, magnetron sputtering and PLD are selected as fabrication techniques for TiN nanomaterials. The fundamental mechanistic aspects of both techniques are discussed in parallel with selected case studies from the recent literature, which elucidate the critical advantages of such techniques to engineer the nanostructure and the plasmonic performance of TiN.

Název v anglickém jazyce

Plasmonic titanium nitride nanomaterials prepared by physical vapor deposition methods

Popis výsledku anglicky

Titanium nitride (TiN) has recently emerged as an alternative to coinage metals to enable the development of integrated plasmonic devices at visible and medium-infrared wavelengths. In this regard, its optical performance can be conveniently tuned by tailoring the process parameters of physical vapor deposition methods, such as magnetron sputtering and pulsed laser deposition (PLD). This review first introduces the fundamental features of TiN and a description on its optical properties, including insights on the main experimental techniques to measure them. Afterwards, magnetron sputtering and PLD are selected as fabrication techniques for TiN nanomaterials. The fundamental mechanistic aspects of both techniques are discussed in parallel with selected case studies from the recent literature, which elucidate the critical advantages of such techniques to engineer the nanostructure and the plasmonic performance of TiN.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

21002 - Nano-processes (applications on nano-scale); (biomaterials to be 2.9)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2023

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

NANOTECHNOLOGY

ISSN

0957-4484

e-ISSN

1361-6528

Svazek periodika

34

Číslo periodika v rámci svazku

50

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

25

Strana od-do

—

Kód UT WoS článku

001081478700001

EID výsledku v databázi Scopus

2-s2.0-85181987469