Interaction of Extreme Ultraviolet Laser Radiation with Solid Surface: Ablation, Desorption, Nanostructuring
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F14%3A00436689" target="_blank" >RIV/68378271:_____/14:00436689 - isvavai.cz</a>
Nalezeny alternativní kódy
RIV/61389021:_____/14:00436689
Výsledek na webu
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DOI - Digital Object Identifier
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Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Interaction of Extreme Ultraviolet Laser Radiation with Solid Surface: Ablation, Desorption, Nanostructuring
Popis výsledku v původním jazyce
Předneseno na:International Symposium on High Power Laser Systems and Applications/20./,Chengdu,25.-29.08.2014,Čína, The area, where interaction of focused XUV laser radiation with solid surface takes place, can be divided according to local fluency intodesorption region (if fluency is larger than zero and smaller than ablation threshold) and ablation region (if fluency is equal or larger than this threshold). It turned out that a direct nanostructuring (e.g. imprinting diffraction pattern created on edges of windows of proximity standing grid) is possible in the desorption region only. While for femtosecond pulses the particle (atom/molecule) removal-efficiency in the desorption region is very small ( < 10%), and hence, it can be easily distinguishedfrom the ablation region with 100%, for nanosecond pulses in desorption region this rises at easily ablated materials from 0% at the periphery up to 90% at the ablation contour and, therefore, the boundary between these two
Název v anglickém jazyce
Interaction of Extreme Ultraviolet Laser Radiation with Solid Surface: Ablation, Desorption, Nanostructuring
Popis výsledku anglicky
Předneseno na:International Symposium on High Power Laser Systems and Applications/20./,Chengdu,25.-29.08.2014,Čína, The area, where interaction of focused XUV laser radiation with solid surface takes place, can be divided according to local fluency intodesorption region (if fluency is larger than zero and smaller than ablation threshold) and ablation region (if fluency is equal or larger than this threshold). It turned out that a direct nanostructuring (e.g. imprinting diffraction pattern created on edges of windows of proximity standing grid) is possible in the desorption region only. While for femtosecond pulses the particle (atom/molecule) removal-efficiency in the desorption region is very small ( < 10%), and hence, it can be easily distinguishedfrom the ablation region with 100%, for nanosecond pulses in desorption region this rises at easily ablated materials from 0% at the periphery up to 90% at the ablation contour and, therefore, the boundary between these two
Klasifikace
Druh
O - Ostatní výsledky
CEP obor
BH - Optika, masery a lasery
OECD FORD obor
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Návaznosti výsledku
Projekt
<a href="/cs/project/GA14-29772S" target="_blank" >GA14-29772S: Nanostrukturování povrchů extrémním ultrafialovým a rentgenovým laserovým zářením</a><br>
Návaznosti
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Ostatní
Rok uplatnění
2014
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů